1.

Conference Proceedings
Conference Proceedings
1. Fabrication of 0.15 ｦﾌm SOIp-MOSFETs using Synchrotron Radiation X-ray Lithography,
Choi,S.S. ; Jeon,Y.J. ; Lyu,J.-S. ; Yoo,H.J. ; Fabrizio,E.D. ; Grella,L. ; Gentili,M.
Pub. info.: Optics for science and new technology : 17th Congress of the International Commission for Optics, August 19-23, 1996, Hotel Riviera(Yusong), Taejon Korea.  Part1  pp.15-16,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2778
2.

Conference Proceedings
Conference Proceedings
2. Thermo-Optic Coefficients of ZrF4-Based Glasses
Cho,W.J. ; Hahn,T.S. ; Choi,S.S. ; Chung,K.H.
Pub. info.: Halide glasses V : proceedings of the 5th International Symposium on Halide Glasses, held at Fuji Institute, Japan, May 29/June 2, 1988.  pp.361-366,  1988.  Switzerland.  Trans Tech Publications
Title of ser.: Materials science forum
Ser. no.: 32-33
3.

Conference Proceedings
Conference Proceedings
3. High-speed photographic system for objects with highly radiant backgrounds
Krishnaswami,K. ; Tilleman,M.M. ; Choi,S.S. ; Krivoshlykov,S.G.
Pub. info.: Color imaging : device-independent color, color hard copy, and graphic arts II : 10-14 February 1997, San Jose, California.  pp.50-57,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3018
4.

Conference Proceedings
Conference Proceedings
4. Analysis of long-period and short-period fiber Bragg gratings by phase-matching condition
Liu,Y. ; Lee,S.B. ; Park,T.S. ; Jo,K.M. ; Choi,S.S.
Pub. info.: Fiber optic components and optical communication : 4-5 November 1996, Beijing, China.  pp.441-448,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2893
5.

Conference Proceedings
Conference Proceedings
5. Performance of small-field 193-nm exposure system
Kim,D.H. ; Lee,K.H. ; Kim,J.S. ; Choi,S.S. ; Oh,H.-K. ; Chung,H.B. ; Yoo,H.J.
Pub. info.: Optical Microlithography X.  pp.922-932,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3051