1.

Conference Proceedings
Conference Proceedings
1. Acid diffusion and evaporation in chemically amplified resists
Kim, J. -B. ; Kwon, Y. -G. ; Choi, J. -H. ; Jung, M. -H.
Pub. info.: Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California.  pp.536-543,  1999.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3678
2.

Conference Proceedings
Conference Proceedings
2. Performace analysis of wavelet based restoration for passive millimeter-wave images
Park, H. ; Kim, S. -H. ; Singh, M. K. ; Choi, J. -H. ; Lee, H. -J. ; Kim, Y. -H.
Pub. info.: Passive millimeter-wave imaging technology VIII : 30-31 March 2005, Orlando, Florida, USA.  pp.157-166,  2005.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5789
3.

Conference Proceedings
Conference Proceedings
3. Impact of mask CD error on wafer CD error at low-k1 photolithography
Kim, B. -G. ; Choi, S. -W. ; Choi, J. -H. ; Chun, C. -U. ; Yoon, H. -S. ; Sohn, J. -M.
Pub. info.: Photomask and X-Ray Mask Technology VI.  pp.572-578,  1999.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3748
4.

Conference Proceedings
Conference Proceedings
4. Reduction of MDP complexity through the application of OASIS based data flow [5992-39]
Jang, S. -H. ; Choi, J. -H. ; Park, J. -S, ; Choi, S. -W.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.599212-599212,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992