1.

Conference Proceedings
Conference Proceedings
1. Progress toward developing high-performance 193-nm single-layer positive resist based on functionalized poly(norbornenes)
Varanasi,P.R. ; Jordhamo,G.M. ; Lawson,M.C. ; Chen,K.-J. ; Brunsvold,W.R. ; Hughes,T. ; Keller,R. ; Khojasteh,M. ; Li,W. ; Allen,R.D. ; Ito,H. ; Opitz,J. ; Truong,H.D. ; Wallow,T.I.
Pub. info.: Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA.  Part2  pp.1157-1162,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3999
2.

Conference Proceedings
Conference Proceedings
2. Defect printing issues with high-contrast chemically amplified resists
Lu,Z.G. ; Moreau,W.M. ; Yin,X. ; Chen,K.-J. ; Thomas,A.C. ; Lawson,P. ; Jordhamo,G.M. ; Wu,C.-H.J.
Pub. info.: Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA.  Part1  pp.136-146,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3999