1.

Conference Proceedings
Conference Proceedings
1. Customized off-axis illumination aperture filtering for sub-0.18-ｦﾌm KrF Lithography
Hsia,C.-C. ; Gau,T.-S. ; Yang,C.-H. ; Liu,R.-C. ; Chang,C.-H. ; Chen,L.-J. ; Wang,C.-M. ; Chen,J.F. ; Smith,B.W. ; Hwang,G.-W. ; Lay,J.-W. ; Goang,D.-Y.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part1  pp.427-434,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
2.

Conference Proceedings
Conference Proceedings
2. CD error sensitivity to "sub-killer" defects at k1 near 0.4:II
Nakagawa,K.H. ; Chen,J.F. ; Socha,R.J. ; Dusa,M.V. ; Laidig,T.L. ; Wampler,K.E. ; Caldwell,R.F. ; Broeke,D.J.van den
Pub. info.: 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California.  Part2  pp.893-904,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3873
3.

Conference Proceedings
Conference Proceedings
3. Practical technology path to sub-0.10-ｦﾌm process generations via enhanced optical lithography
Chen,J.F. ; Laidig,T.L. ; Wampler,K.E. ; Caldwell,R.F. ; Nakagawa,K.H. ; Liebchen,A.
Pub. info.: 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California.  Part2  pp.995-1016,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3873
4.

Conference Proceedings
Conference Proceedings
4. Assessment of a hypothetical road map that extends optical lithography through the 70-nm technology node
Petersen,J.S. ; McCallum,M. ; Kachwala,N. ; Socha,R.J. ; Chen,J.F. ; Laidig,T.L. ; Smith,B.W. ; Gordon,R.L. ; Mack,C.A.
Pub. info.: Lithography for semiconductor manufacturing : 19-21 May 1999, Edinburgh, Scotland.  pp.73-89,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3741
5.

Conference Proceedings
Conference Proceedings
5. Effects of off-axis illumination and scatterirng-bar optical proximity correction on the impact of lens aberration on 130-nm polygate mask:a simulation study
Nakagawa,K.H. ; Hollerbach,U. ; Chen,J.F.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part2  pp.1070-1078,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
6.

Conference Proceedings
Conference Proceedings
6. Effects of advanced illumination schemes on design manufacturability and interactions with optical proximity corrections
Capodieci,L. ; Torres,J.A. ; Socha,R.J. ; Hollerbach,U. ; Chen,J.F. ; Os,C.van ; Granik,Yu. ; Toublan,O. ; Cobb,N.B.
Pub. info.: Challenges in process integration and device technology : 18-19 September 2000, Santa Clara, USA.  pp.58-67,  2000.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4181
7.

Conference Proceedings
Conference Proceedings
7. Forbidden pitches for 130-nm lithography and below
Socha,R.J. ; Dusa,M.V. ; Capodieci,L. ; Finders,J. ; Chen,J.F. ; Flagello,D.G. ; Cummings,K.D.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part2  pp.1140-1155,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
8.

Conference Proceedings
Conference Proceedings
8. Imaging contrast improvement for 160-nm line features using subresolution assist features with binary,six percent ternary attenuated phase-shift mask with process-tuned resist
Kachwala,N. ; Petersen,J.S. ; Chen,J.F. ; Canjemi,M. ; McCallum,M.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part1  pp.55-67,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
9.

Conference Proceedings
Conference Proceedings
9. Design of 200-nm,170-nm,and 140-nm DUV contact sweeper high-transmission attenuating phase-shift mask:?.Experimental results
Socha,R.J. ; Shi,X. ; Holman,K.C. ; Dusa,M.V. ; Conley,W. ; Petersen,J.S. ; Chen,J.F. ; Laidig,T.L. ; Wampler,K.E. ; Caldwell,R.F. ; Chu,M.C. ; Su,C. ; Huang,K. ; Chen,C. ; Le,C. ; Pierrat,C. ; Su,B.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part1  pp.38-54,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
10.

Conference Proceedings
Conference Proceedings
10. Design and analysis of across-chip linewidth variation for printed features at 130 nm and below
Chen,J.F. ; Socha,R.J. ; Puntambekar,K. ; Wampler,K.E. ; Caldwell,R.F. ; Dusa,M.V. ; Love,J.C. ; Yeric,G. ; Stoner,B.
Pub. info.: Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California.  pp.168-177,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3998