1.

Conference Proceedings
Conference Proceedings
1. Customized illumination aperture filter for low k1 photolithography process
Gau,T.-S. ; Liu,R.-G. ; Chen,C.-K. ; Lai,C.-M. ; Liang,F.-J. ; Hsia,C.C.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part1  pp.271-282,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
2.

Conference Proceedings
Conference Proceedings
2. Trench pattern lithography for 0.13- and 0.10-μm logic devices at 248- and 193-nm wavelengths
Wang,Y.-Y. ; Lin,H.-T. ; Yu,S.-S. ; Chen,C.-K. ; Ku,Y.-C. ; Yen,A. ; Lin,B.J.
Pub. info.: Optical Microlithography XIV.  4346  pp.276-292,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346