1.

Conference Proceedings
Conference Proceedings
1. RET for the wiring layer of a 3D memory [6156-38]
Chen, Y.-T. ; Poon, P. ; Petti, C. ; Kamat, V. ; Sezginer. A. ; Huang, H.-T.
Pub. info.: Design and process integration for microelectronic manufacturing IV : 23-24 February, 2006, San Jose, California, USA.  pp.61561E-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6156
2.

Conference Proceedings
Conference Proceedings
2. Post printing optimization with chromeless phase shitting mask
Chen, Y.-T.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.1485-1492,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
3.

Conference Proceedings
Conference Proceedings
3. Photomask with interior nonprinting phase-shifting window for printing small post structures
Chen, Y.-T.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.595-602,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446
4.

Conference Proceedings
Conference Proceedings
4. Low 1(1 post printing using phase shifting mask [5853-56]
Chen, Y.-T. ; Lee, M. T. ; Chen, C. P. ; Huang, Y. Y. ; Wu, T. ; Ho, B. C.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.714-721,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853
5.

Conference Proceedings
Conference Proceedings
5. Image performance and mask characterization of 157-nm alternating phase-shifting mask
Chen, Y.-T. ; Meute, J. ; Dean, K.R. ; Stark, D.R. ; Schilz, C.M. ; Dettmann, W. ; Koehle, R. ; Schiessl, B. ; Degel, W.
Pub. info.: Optical Microlithography XVI.  Part One  pp.618-628,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
6.

Conference Proceedings
Conference Proceedings
6. Surface morphology and subsurface damaged layer of various glasses machined by I ,3-nm ArF excimer laser
Liao, Y. ; Chen, Y.-T. ; Chao, C.-L. ; Liu, Y.-M.
Pub. info.: Micromachining and Microfabrication Process Technology X.  pp.110-117,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5715
7.

Conference Proceedings
Conference Proceedings
7. 157-nm alternating phase-shifting mask design and high-NA images
Chen, Y.-T. ; Meute, J. ; Dean, K. ; Brooker, P.D.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.905-912,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256
8.

Conference Proceedings
Conference Proceedings
8. Pushing KrF photolithography limit for 3D integrated circuit
Chen, Y.-T. ; Radigan, S.
Pub. info.: Optical Microlithography XVII.  pp.997-1004,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377