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14 results

Conference Proceedings

1. Wide-angle lens for miniature capsule endoscope [6080-21]

Ou-Yang M ; Chen, Y. L. ; Lee, H. H. ; Lu, S. ; Wu, H. M.

Pub. info.:	Advanced biomedical and clinical diagnostic systems IV : 22-24 January 2006, San Jose, California, USA. pp.608010-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6080

Conference Proceedings

2. ION CHANNELING STUDY OF EPITAXIAL GROWTH OF α-Fe ON H-TERMINATED Si(111) SURFACES

Karmarkar, M. M. ; Padmanabhan, K. R. ; Cheng, Y. -T. ; Chen, Y. L.

Pub. info.:	Interface dynamics and growth : symposium held December 2-6, 1991, Boston, Massachusetts, U.S.A.. pp.423-428, 1992. Pittsburgh, Pa.. Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	237

Conference Proceedings

3. Investigation of the trap states and their effect on the low-frequency noise in GaN/AlGaN HFETs

Liu, W. L. ; Chen, Y. L. ; Balandin, A. A. ; Wang, K. L.

Pub. info.:	Noise in devices and circuits III : 24-26 May, 2005, Austin, Texas, USA. pp.268-275, 2005. Bellingham, Washington. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5844

Conference Proceedings

4. TITANIUM GERMANOSILICIDE: PHASE FORMATION, SEGREGATION, AND MORPHOLOGY

Aldrich, D. B. ; Chen, Y. L. ; Sayers, D. E. ; Nemanich, R. J.

Pub. info.:	Silicides, germanides, and their interfaces : Symposium held November 29-December 2, 1993, Boston, Massachusetts, U.S.A.. pp.305-, 1994. Pittsburgh, PA. MRS - Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	320

Conference Proceedings

5. Titanium Germanosilicide Phase Formation During the Ti-Si1-xGex Solid Phase Reactions

Aldrich, D. B. ; Chen, Y. L. ; Sayers, D. E. ; Nemanich, R. J.

Pub. info.:	Silicide thin films - fabrication, properties, and applications : Symposium held November 27-30, 1995, Boston, Massachusetts, USA. pp.405-, 1996. Pittsburgh. MRS - Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	402

Conference Proceedings

6. Phase Separation in Simulated Plutonium Glasses With Phosphate and Fluorine and the Effect on Glass Corrosion in Water

Li, H. ; Vienna, J. D. ; Chen, Y. L. ; Wang, L. Q. ; Liu, J.

Pub. info.:	Scientific basis for nuclear waste management XX : symposium held December 2-6, 1996, Boston, Massachusetts, U.S.A.. pp.277-, 1997. Pittsburgh, Pa.. MRS - Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	465

Conference Proceedings

7. A STUDY OF SURFACE AND SUBSURFACE PROPERTIES OF Si(100) AFTER HYDROGEN ION-BEAM EXPOSURE

Liu, H. X. ; Schneider, T. P. ; Montgomery, J. ; Chen, Y. L. ; Buczkowski, A. ; Shimura, F. ; Nemanich, R. J. ; Maher, D. M. ; Korzec, D. ; Engemann, J.

Pub. info.:	Surface chemical cleaning and passivation for semiconductor processing. pp.231-, 1993. Pittsburgh, PA. MRS - Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	315

Conference Proceedings

8. PLASMA SURFACE INTERACTIONS AND SURFACE PRORERTIES FOR REMOTE H-PLASMA CLEANING OF Si(100)

Schneider, T. P. ; Cho, J. ; Chen, Y. L. ; Maher, D. M. ; Nemanich, R. J.

Pub. info.:	Surface chemical cleaning and passivation for semiconductor processing. pp.197-, 1993. Pittsburgh, PA. MRS - Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	315

Conference Proceedings

9. Removal of SiO2 from Si(100) by Remote H2/SiH4 Plasma Prior to Epitaxial Growth

Barnak, J. P. ; Ying, H. ; Chen, Y. L. ; Montgomery, J. ; Nemanich, R. J.

Pub. info.:	Ultraclean semiconductor processing technology and surface chemical cleaning and passivation : Symposum held April 17-19, 1995, San Francisco, California, USA. pp.351-, 1995. Pittsburgh, PA. MRS - Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	386

10.

Conference Proceedings

10. RIE Passivation Layer Removal by Remote H-Plasma and H2/SiH4 Plasma Processing

Ying, Hong ; Barnak, J. P. ; Chen, Y. L. ; Nemanich, R. J.

Pub. info.:	Ultraclean semiconductor processing technology and surface chemical cleaning and passivation : Symposum held April 17-19, 1995, San Francisco, California, USA. pp.285-, 1995. Pittsburgh, PA. MRS - Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	386

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Author: Chen, Y. L.