1.

Conference Proceedings
Conference Proceedings
1. Performance of 300-mm lithography tools in a pilot production line
Maltabes,J.G. ; Charles,A.B. ; Hornig,S.R. ; Schedel,T. ; Ganz,D. ; Schmidt,S.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part1  pp.483-496,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
2.

Conference Proceedings
Conference Proceedings
2. Effect of nonlinear errors on 300-mm wafer overlay performance
Schmidt,S. ; Charles,A.B. ; Ganz,D. ; Hornig,S.R. ; Hraschan,G. ; Maltabes,J.G. ; Mautz,K.E. ; Metzdorf,T. ; Otto,R. ; Scheurich,J. ; Schedel,T. ; Schuster,R.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part2  pp.857-865,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
3.

Conference Proceedings
Conference Proceedings
3. Process performance comparisons on 300-mm i-line steppers,DUV stepper,and DUV scanners
Schedel,T. ; Charles,A.B. ; Ganz,D. ; Hornig,S.R. ; Hraschan,G. ; Kostler,W. ; Maltabes,J.G. ; Mautz,K.E. ; Metzdorf,T. ; Otto,R. ; Schmidt,S. ; Schuster,R.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part1  pp.335-342,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
4.

Conference Proceedings
Conference Proceedings
4. Is lithography ready for 300 mm?
Charles,A.B. ; Haris,C. ; Hornig,S.R. ; Ganz,D. ; Schedel,T. ; Hraschan,G. ; Kostler,W. ; Maltabes,J.G. ; Mautz,K.E. ; Schmidt,S. ; Schuster,R.
Pub. info.: Challenges in process integration and device technology : 18-19 September 2000, Santa Clara, USA.  pp.254-264,  2000.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4181
5.

Conference Proceedings
Conference Proceedings
5. Litho clusters with integrated metrology:the next step in continuous flow manufacturing
Stanley,T. ; Maltabes,J.G. ; Mautz,K.E. ; Dougan,J. ; Charles,A.B. ; Garbayo,J.
Pub. info.: Process, equipment, and materials control in integrated circuit manufacturing V : 22-23 September, 1999, Santa Clara, California.  pp.132-137,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3882
6.

Conference Proceedings
Conference Proceedings
6. Current state of 300-mm lithography in a pilot line environment
Charles,A.B. ; Maltabes,J.G. ; Hornig,S.R. ; Schedel,T. ; Ganz,D. ; Schmidt,S. ; Grant,L. ; Hraschan,G. ; Mautz,K.E. ; Otto,R.
Pub. info.: Process, equipment, and materials control in integrated circuit manufacturing V : 22-23 September, 1999, Santa Clara, California.  pp.140-153,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3882
7.

Conference Proceedings
Conference Proceedings
7. Photolithography equipment control through D-optimal design
Charles,A.B. ; Chandon,Y. ; Bergeret,F. ; Garcia,L.
Pub. info.: Process, Equipment, and Materials Control in Integrated Circuit Manufacturing II.  pp.71-85,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2876