1.

Conference Proceedings
Conference Proceedings
1. Progress toward submicron hard x-ray imaging using elliptically bent mirrors
MacDowell,A.A. ; Celestre,R. ; Chang,C.-H. ; Franck,K. ; Howells,M.R. ; Locklin,S.C. ; Padmore,H.A. ; Patel,J.R. ; Sandler,R.
Pub. info.: Materials, manufacturing, and measurement for synchrotron radiation mirrors : 30-31 July 1997, San Diego, California.  pp.126-133,  1997.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3152
2.

Conference Proceedings
Conference Proceedings
2. Customized off-axis illumination aperture filtering for sub-0.18-ｦﾌm KrF Lithography
Hsia,C.-C. ; Gau,T.-S. ; Yang,C.-H. ; Liu,R.-C. ; Chang,C.-H. ; Chen,L.-J. ; Wang,C.-M. ; Chen,J.F. ; Smith,B.W. ; Hwang,G.-W. ; Lay,J.-W. ; Goang,D.-Y.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part1  pp.427-434,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
3.

Conference Proceedings
Conference Proceedings
3. Optimizing the clean effect of wafer backside in lithography developer process
Lin,H.-P. ; Chang,C.-H. ; Lee,C.-H. ; Pang,S.L. ; Lu,K.L.
Pub. info.: Process, equipment, and materials control in integrated circuit manufacturing V : 22-23 September, 1999, Santa Clara, California.  pp.193-199,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3882
4.

Technical Paper
Technical Paper
4. Parallel Implicit Euler Solver on Homogeneous and Heterogeneous Computing Environments
Lee,P. ; Chang,C.-H. ; Wu,J.-J.
Pub. info.: A collection of technical papers : 15th AIAA Computational Fluid Dynamics Conference and exhibit.  v. 1  pp.442-451,  2001.  Reston, VA.  American Institute of Aeronautics and Astronautics
Title of ser.: AIAA Paper : AIAA Computational Fluid Dynamics Conference
Ser. no.: 2001
5.

Conference Proceedings
Conference Proceedings
5. Finite-element analysis of solder joint strength in laser diode packaging
Chang,C.-H. ; Sheen,M.-T. ; Kuang,J.-H. ; Chen,C.-C. ; Wang,G.-L. ; Cheng,W.-H. ; Chang,H.-L. ; Wang,S.-C. ; Wang,C. ; Wang,C.-M.
Pub. info.: Optoelectronic Materials and Devices II.  pp.646-651,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4078
6.

Conference Proceedings
Conference Proceedings
6. Lithography challenges of dual-damascence process in 0.13-μm era
Chen,L.-J. ; Shiu,L.-H. ; Tsai,C.-S. ; Chang,C.-H. ; Kang,T.-K. ; Chou,S.-Y.
Pub. info.: Optical Microlithography XIV.  4346  pp.907-916,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
7.

Conference Proceedings
Conference Proceedings
7. Particle contamination within the tungsten etch back chamber
Chu,P.-T. ; Chang,K.-H. ; Peng,T.-M. ; Chang,C.-H. ; Yen,S.-W. ; Lin,T.-H. ; Chang,C.-R.
Pub. info.: Microelectronic Manufacturing Yield, Reliability, and Failure Analysis.  pp.66-76,  1995.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2635
8.

Conference Proceedings
Conference Proceedings
8. Utilization of assisting features in contact-hole mask repair
Chang,C.-Y. ; Chang,C.-H. ; Lin,C.-Y. ; Hung,C.-C. ; Lin,C.-H. ; Lin,J.C.H.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VIII.  pp.583-591,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4409
9.

Conference Proceedings
Conference Proceedings
9. Alternating phase shifting mask implementation to 0.1-μm logic gates
Chang,C.-H. ; Tzu,S.-D. ; Hsieh,C.-H. ; Dai,C.M. ; Lin,B.J. ; Lin,C.-H. ; Liu,H.-Y.
Pub. info.: 21st Annual BACUS Symposium on Photomask Technology.  4562  pp.368-378,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4562