1.

Conference Proceedings
Conference Proceedings
1. Real Time Intrusive Optical Emission Spectroscopy for Process Control
Lee, P-W. ; Kim, Y-J. ; Seo, S.H. ; Kim, J-H. ; Chang, H-Y.
Pub. info.: Proceedings of the Symposium on Process control, Diagnostics, and Modeling in Semiconductor Manufacturing.  pp.208-217,  1995.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 95-2
2.

Conference Proceedings
Conference Proceedings
2. A study on Low Dielectric Material Deposition Using a Helicon Plasma Source
Choi, C-K. ; Oh, Y.J. ; Lee, K-M ; Kim, J-H. ; Chang, H-Y. ; Kang, S-W.
Pub. info.: Proceedings of the eleventh International Symposium on Plasma Processing.  pp.651-661,  1996.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 96-12
3.

Conference Proceedings
Conference Proceedings
3. MAGNETIC PROPERTIES OF COMPOSITE AMORPHOUS POWDER CORES
Chang, H-Y. ; Yao, P-C. ; Huang, D-R. ; Hsu, S-E.
Pub. info.: Science and technology of rapidly quenched alloys : symposium held December 1-3, 1986, Boston, Massachusetts, U.S.A..  pp.423-428,  1987.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 80
4.

Conference Proceedings
Conference Proceedings
4. Characteristics of an Inductively Coupled C12/Ar Plasma and its Application to Cu Etching
Seo, S-H. ; Kim, J-H. ; Lee, P-W. ; Chang, H-Y.
Pub. info.: Proceedings of the Symposium on Process control, Diagnostics, and Modeling in Semiconductor Manufacturing.  pp.327-338,  1995.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 95-2
5.

Conference Proceedings
Conference Proceedings
5. Production of High Density Plasma on the Substrate in a Helicon Source and application to the Deposition of SiOF Film with Low Dielectric Constant
Kim, J-H. ; Seo, S-H. ; Yun, S-M. ; Chang, H-Y. ; Choi, C-K. ; Lee, K-M.
Pub. info.: Proceedings of the Symposium on Process control, Diagnostics, and Modeling in Semiconductor Manufacturing.  pp.461-473,  1995.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 95-2
6.

Conference Proceedings
Conference Proceedings
6. Determination of the Relative F Concentration and its Radial Profile by Plasma Parameter Normalization in an Electron Cyclotron Resonance SF6/Ar Discharge
Kim, Y-J. ; Lee, P-W. ; Chang, H-Y. ; Chang, C.S.
Pub. info.: Proceedings of the Symposium on Process control, Diagnostics, and Modeling in Semiconductor Manufacturing.  pp.339-349,  1995.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 95-2
7.

Technical Paper
Technical Paper
7. A Study on a Long Range Nano- Precision Positioning System.
Chen, J-L. ; Chang, H-Y. ; Wu, C-S.
Pub. info.: A.S.M.E. paper.  2003.  New York, NY.  American Society of Mechanical Engineers
Title of ser.: ASME Technical Paper : IMECE
Ser. no.: 2003