1.

Conference Proceedings
Conference Proceedings
1. Investigation of lithography performance using multipass gray(MPG)with MEBES 5000
Dean,R.L. ; Alexander,D. ; Chabala,J.M. ; Coleman,T. ; Hartglass,C. ; Lu,M. ; Sauer,C.A. ; Weaver,S.
Pub. info.: 15th European Conference on Mask Technology for Integrated Circuits and Microcomponents '98 : 16-17 November 1998, Munich-Unterhaching, Germany.  pp.166-178,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3665
2.

Conference Proceedings
Conference Proceedings
2. Lithographic analysis of multipass gray writing strategy for electron-beam pattern generation
Chabala,J.M. ; Abboud,F.E. ; Dean,R.L. ; Weaver,S. ; Cole,D.M. ; Sauer,C.A. ; F.Raymond ? ; Hofmann,U.
Pub. info.: Emerging lithographic technologies III : 15-17 March 1999, Santa Clara, California.  Part1  pp.80-99,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3676
3.

Conference Proceedings
Conference Proceedings
3. 130-nm node mask development
Chabala,J.M. ; Weaver,S. ; Alexander,D. ; Lu,M. ; Kim,N.-W. ; Cole,D.M.
Pub. info.: 17th European Conference on Mask Technology for Integrated Circuits and Microcomponents.  pp.42-50,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4349
4.

Conference Proceedings
Conference Proceedings
4. Extension of graybeam writing for the 130-nm technology node
Chabala,J.M. ; Abboud,F.E. ; Sauer,C.A. ; Weaver,S. ; Lu,M. ; Pearce-Percy,H.T. ; Hofmann,U. ; Vernon,M. ; Ton,D. ; Cole,D.M. ; Naber,R.J.
Pub. info.: 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California.  Part1  pp.36-48,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3873
5.

Conference Proceedings
Conference Proceedings
5. Lithography and CD performance of advanced MEBES mask pattern generators
Chabala,J.M. ; Cole,D.M. ; Pearce-Percy,H.T. ; Phillips,W. ; Lu,M. ; Weaver,S. ; Alexander,D. ; Coleman,T. ; Sauer,C.A. ; Abboud,F.E.
Pub. info.: 16th European Conference on Mask Technology for Integrated Circuits and Microcomponents : 15-16 November 1999, Munich, Germany.  pp.200-215,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3996
6.

Conference Proceedings
Conference Proceedings
6. Evaluation of a high-dose extended multipass gray writing system for 130-nm pattern generation
Chabala,J.M. ; Weaver,S. ; Alexander,D. ; Pearce-Percy,H.T. ; Lu,M. ; Cole,D.M. ; Abboud,F.E.
Pub. info.: Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA.  pp.309-325,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3997
7.

Conference Proceedings
Conference Proceedings
7. Lithography performance of contact holes:II.Simulation of effects of reticle corner rounding on wafer print performance
Mack,C.A. ; Sauer,C.A. ; Chabala,J.M.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VII.  pp.172-179,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4066
8.

Conference Proceedings
Conference Proceedings
8. Lithography performance of contact holes:I.Optimization of Pattern fidelity using MPG and MPG-II
Weaver,S. ; Lu,M. ; Chabala,J.M. ; Ton,D. ; Sauer,C.A. ; MAck,C.A.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VII.  pp.160-171,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4066
9.

Conference Proceedings
Conference Proceedings
9. New MEBES pattern generator
Chabala,J.M. ; Abboud,F.E. ; Weaver,S. ; Cole,D.M.
Pub. info.: 18th Annual BACUS Symposium on Photomask Technology and Management.  pp.74-85,  1998.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3546