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14 results

Conference Proceedings

1. SURFACE PREPARATION USING ANHYDROUS FLUORIDE AND AQUEOUS H2O PRIOR TO LOW TEMPERATURE EPITAXIAL SILICON DEPOSITION

Frystak, D.C. ; Wise, R. ; Grothe, P. ; Barnett, J. ; Fowler, B. ; Carpio, R.

Pub. info.:	Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing. pp.62-70, 1997. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	97-35

Conference Proceedings

2. CONCENTRATION CONTROL IN SC-1 MEGASONIC BATHS

Soucy, J. ; Carpio, R. ; Peterman, S. ; Jahnanbani, M.

Pub. info.:	Proceedings of the Symposium on Contamination Control and Defect Reduction in Semiconductor Manufacturing III. pp.253-266, 1994. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	1994-9

Conference Proceedings

3. Application of an Automated Contact Angle Measurement Instrument to Advanced Lithographic and Wafer Cleaning Processes

Carpio, R. ; Petersen, J.S. ; Hudson, D.

Pub. info.:	Proceedings of the Second International Symposium on Process Control, Diagnostics, and Modeling in Semiconductor Manufacturing. pp.222-232, 1997. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	97-9

Conference Proceedings

4. Bath Additive and Current Density Effects on Copper Electroplating Fill of Cu Damascene Structures

Mikkola, R. D. ; Jiang, Q-T. ; Carpio, R. ; Carpenter, B.

Pub. info.:	Advanced interconnects and contacts : symposium held April 5-7, 1999, San Francisco, California, U.S.A.. pp.399-, 1999. Warrendale, Pa.. MRS - Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	564

Conference Proceedings

5. Modeling, Simulation and Control of Single Wafer Process in Cluster Tool Base on FT-IR-Line Sensor

Liu, Shaohua ; Solomon, Peter ; Carpio, R. ; Fowler, B. ; Simmons, D. ; Wang, J. ; Wise, R. ; Imper, G. ; Riley, N. B. ; Moslehi, M. ; Ravindra, N. M.

Pub. info.:	Modeling and simulation of thin-film processing : symposium held April 17-20, 1995, San Francisco, California, U.S.A.. pp.269-, 1995. Pittsburgh. MRS - Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	389

Conference Proceedings

6. The Use of Capillary Electrophoresis for the Evaluation of Post Metal Etch Cleaning Processes

Chan, T. ; Carpio, R. ; VanMeurs, R.

Pub. info.:	Proceedings of the Third International Symposium on Corrosion and Reliability of Electronic Materials and Devices. pp.260-269, 1994. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	1994-29

Conference Proceedings

7. Influence of Leveling Agents on Surface Roughness of Electrodeposited Copper Films

Witt, C. ; Srinivasan, J. ; Carpio, R.

Pub. info.:	Electrochemical processes in ULSI and MEMS : proceedings of the international symposium. pp.57-66, 2005. Pennington, N.J.. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2004-17

Conference Proceedings

8. Bath Additive and Current Density Effects on Copper Electroplating Fill of Cu Damascene Structures

Carpenter, B. ; Carpio, R. ; Jiang, Q-T. ; Mikkola, R. D.

Pub. info.:	Polycrystalline metal and magnetic thin films : symposium held April 5-8, 1999, San Francisco, California, U.S.A.. pp.235-242, 1999. Warrendale, PA. Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	562

Conference Proceedings

9. A Comparison of Infrared Reflectance Spectroscopy and Spectroscopic Ellipsometry for Polysilicon Film Process Control

Carpio, R. ; Fowler, B. ; Simmons, D.G. ; Liu, S. ; Solomon, P.R.

Pub. info.:	Proceedings of the Symposium on Diagnostic Techniques for Semiconductor Materials and Devices. pp.243-253, 1994. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	1994-33

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Conference Proceedings

10. Characterization and Control of Copper/Barrier Chemical Mechanical Polishing In Damascene Processing Using Non-contact Capacitive Measurements

Carpio, R. ; Tran, T. ; Martin, G. ; Estrada, R.

Pub. info.:	Chemical Mechanical Planarization : proceedings of the International Symposium. pp.101-112, 2002. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2002-1

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