1.

Conference Proceedings
Conference Proceedings
1. Etch, reticle, and track CD fingerprint corrections with local dose compensation
van der Laan, H. ; Carpaij, R. ; Krist, J. ; Noordman, O. ; van Dommelen, Y. ; van Schoot, J. ; Blok, F. ; van Os, C. ; Stegeman, S. ; Hoogenboom, T. ; Hickman, C. ; Byers, E. ; Gugel, T.
Pub. info.: Data analysis and modeling for process control II : 3-4 March, 2005, San Jose, California, USA.  pp.107-118,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5755
2.

Conference Proceedings
Conference Proceedings
2. In-line lithography cluster monitoring and control using integrated scatterometry
Pollentier, I. ; Cheng, S.Y. ; Baudemprez, B. ; Laidler, D. ; van Dommelen, Y. ; Carpaij, R. ; Yu, J. ; Uchida, J. ; Viswanathan, A. ; Chin, D. ; Barry, K. ; Jakatdar, N.
Pub. info.: Data analysis and modeling for process control : 26-27 February 2004, Santa Clara, California, USA.  pp.105-115,  2004.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5378
3.

Conference Proceedings
Conference Proceedings
3. Optimizing and enhancing optical systems to meet the low k1 challenge
Flagello, D.G. ; Socha, R.J. ; Shi, X. ; Schoot, J.B. ; Baselmans, J. ; Kerkhof, M.A. ; Boeij, W. ; Engelen, A. ; Carpaij, R. ; Noordman, O. ; Moers, M.H.P. ; Mulder, M. ; Finders, J. ; Greevenbroek, H. ; Schriever, M. ; Maul, M. ; Haidner, H. ; Goeppert, M. ; Wegmann, U. ; Graeupner, P.
Pub. info.: Optical Microlithography XVI.  Part One  pp.139-150,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
4.

Conference Proceedings
Conference Proceedings
4. Compensating measured intra-wafer ring oscillator stage delay with intra-wafer exposure dose corrections [6152-71]
Verhaegen, S. ; Nackaerts, A. ; Dusa, M. ; Carpaij, R. ; Vandenberghe, G. ; Finders, J.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XX.  pp.61521Y-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6152
5.

Conference Proceedings
Conference Proceedings
5. Characterization of integrated optical CD for process control
Yu, J. ; Uchida, J. ; van Dommelen, Y. ; Carpaij, R. ; Cheng, S. ; Pollentier, I. ; Viswanathan, A. ; Lane, L. ; Barry, K.A. ; Jakatdar, N.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVIII.  pp.1059-1068,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5375