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Conference Proceedings

1. Optical superlattices as phase-shift masks for microlithography

Carcia,P.F. ; French,R.H. ; Reynolds,G.A.M. ; Hughes,G.P. ; Torardi,C.C. ; Reilly,M.H. ; Lemon,M.F. ; Miao,C.R. ; Jones,D.J. ; Wilson,L. ; Dieu,L.

Pub. info.:	Engineered nanostructural films and materials : 22-23 July 1999, Denver, Colorado. pp.23-35, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3790

Conference Proceedings

2. Materials screening for attenuating embedded phase-shift photoblanks for DUV and 193-nm photolithography

Carcia,P.F. ; French,R.H. ; Sharp,K.G. ; Meth,J.S. ; Smith,B.W.

Pub. info.:	16th Annual BACUS Symposium on Photomask Technology and Management. pp.255-263, 1996. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2884

Conference Proceedings

3. Ion-beam sputter-deposited SiN/TiN attenuating phase-shift photoblanks

Dieu,L. ; Carcia,P.F. ; Mitsui,H. ; Ueno,K.

Pub. info.:	20th Annual BACUS Symposium on Photomask Technology. pp.810-817, 2000. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4186

Conference Proceedings

4. TiSi-nitride attenuating phase-shift photomask for 193-nm lithography

Reynolds,G.A.M. ; French,R.H. ; Carcia,P.F. ; Torardi,C.C. ; Hughes,G.P. ; Jones,D.J. ; Lemon,M.F. ; Reilly,M. ; Wilson,L. ; Miao,C.R.

Pub. info.:	18th Annual BACUS Symposium on Photomask Technology and Management. pp.514-523, 1998. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3546