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11 results

Conference Proceedings

1. STUDY OF SiF4N2-H2 PLASMAS FOR THE DEPOSITION OF FLUORINATED SILICON NITRIDE FILMS

Cicala, G. ; Bruno, G. ; Capezzuto, P. ; Losurdo, M.

Pub. info.:	Amorphous insulating thin films : symposium held December 1-4, 1992, Boston, Massachusetts, U.S.A.. pp.27-32, 1993. Pittsburgh, Pa.. Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	284

Conference Proceedings

2. EFFECT OF PLASMA MODULATION IN THE GLOW DISCHARGE DEPOSITION OF AMORPHOUS SILICON FILMS

Bruno, G. ; Capezzuto, P. ; Cicala, G. ; Manodoro, P.

Pub. info.:	Chemical perspectives of microelectronic materials II : symposium held November 26-28, 1990, Boston, Massachusetts, U.S.A.. pp.289-294, 1991. Pittsburgh, Pa.. Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	204

Conference Proceedings

3. GaAs Plasma Processing Monitored by In Situ Ellipsometry

Losurdo, M. ; Capezzuto, P. ; Bruno, G.

Pub. info.:	Chemical vapor deposition : proceedings of the Fourteenth International Conference and EUROCVD-11. pp.644-651, 1997. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	97-25

Conference Proceedings

4. Plasma Enhanced Chemical Vapor Deposition of Er-Doped Amorphous Silicon Thin Films

Giangregorio, M.M. ; Losurdo, M. ; Capezzuto, P. ; Bruno, G.

Pub. info.:	Chemical vapor deposition XVI and EUROCVD 14 : proceedings of the international symposium. pp.716-721, 2003. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2003-8

Conference Proceedings

5. MASS SPECTROMETRIC THERMAL EVOLUTION OF NOVEL INDIUM METALORGANIC PRECURSORS FOR MOCVD

Bruno, G. ; Capezzuto, P. ; Cicala, G. ; Losurdo, M. ; Rossetto, G. ; Porchia, M. ; Zanella, P.

Pub. info.:	Chemical perspectives of microelectric materials III : symposium held November 30-December 3, 1992, Boston, Massachusetts, U.S.A.. pp.69-74, 1993. Pittsburgh, Pa.. Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	282

Conference Proceedings

6. Low Temperature Deposition of Microcrystalline Silicon Films by Plasma Assisted CVD

Grimaldi, A. ; Sacchetti, A. ; Losurdo, M. ; Ambrico, M. ; Capezzuto, P. ; Bruno, G.

Pub. info.:	Chemical vapor deposition XVI and EUROCVD 14 : proceedings of the international symposium. pp.661-667, 2003. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2003-8

Conference Proceedings

7. Enhancement of the Amorphous to Microcrystalline Phase Transition in Silicon Films Deposited by SiF4-H2-He Plasmas

Cicala, G. ; Losurdo, M. ; Capezzuto, P. ; Bruno, G. ; Ligonzo, T. ; Schiavulli, L. ; Minarini, C. ; Rossi, M. C.

Pub. info.:	Microcrystalline and nanocrystalline semiconductors--1998 : symposium held November 30-December 3, 1998, Boston, Massachusetts, U.S.A.. pp.493-, 1999. Warrendale, PA. MRS - Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	536

Conference Proceedings

8. GaN Growth by Remote Plasma MOCVD: Chemistry and Kinetics by Real Time Ellipsometry

Losurdo, M. ; Capezzuto, P. ; Bruno, G.

Pub. info.:	GaN and related alloys : symposium held November 30-December 4, 1998, Boston, Massachusetts, U.S.A.. pp.G3.12.1-, 1999. Warrendale, Pa.. MRS - Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	537

Conference Proceedings

9. Deposition of Photoluminescent Nanocrystalline Silicon Films by SiF4-SiH4-H2 Plasmas

Cicala, G. ; Bruno, G. ; Capezzuto, P. ; Schiavulli, L. ; Capozzi, V. ; Perna, G.

Pub. info.:	Advances in microcrystalline and nanocrystalline semiconductors, 1996 : symposium held December 2-6, 1996, Boston, Massachusetts, U.S.A.. pp.809-, 1997. Pittsburgh, Pa.. MRS - Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	452

10.

Conference Proceedings

10. Low-Temperature Growth of HfO2 Dielectric Layers by Plasma-Enhanced CVD

Losurdo, M. ; Giangregorio, M. M. ; Luchena, M. ; Capezzuto, P. ; Bruno, G. ; Barreca, D. ; Gasparotto, A. ; Tondello, E.

Pub. info.:	Fundamentals of novel oxide/semiconductor interfaces : symposium held December 1-4, 2003, Boston, Massachusetts, U.S.A.. pp.227-232, 2004. Warrendale, Pa.. Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	786

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Author: Capezzuto, P.