1.

Conference Proceedings
Conference Proceedings
1. Improved phase uniformity control using a new AAPSM etch stop layer technique
Lassiter, M. ; Cangemi, M.J. ; Taylor, D.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.412-422,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256
2.

Conference Proceedings
Conference Proceedings
2. Comparisons of 9% versus 6% transmission attenuated phase-shift mask for the 65-nm device mode
Montgomery, P.K. ; Lucas, K.D. ; Litt, L.C. ; Conley, W. ; Fanucchi, E. ; Van Wingerden, J. ; Vandenberghe, G. ; Wiaux, V. ; Taylor, D. ; Cangemi, M.J. ; Kasprowicz, B.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.814-825,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256
3.

Conference Proceedings
Conference Proceedings
3. 193-nm EAPSM inspection comparison: commercial versus alternative absorber material
Taylor, D. ; Lassiter, M. ; Cangemi, M.J.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.1168-1173,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256