1.

Conference Proceedings
Conference Proceedings
1. PARTICLE REDUCTION IN POST-VIA ETCH PROCESS
Yang, M. ; Campbell, J.P.
Pub. info.: Proceedings of the Symposium on Contamination Control and Defect Reduction in Semiconductor Manufacturing III.  pp.25-30,  1994.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 1994-9
2.

Conference Proceedings
Conference Proceedings
2. Atomic Scale Defects Involved in Stress Induced Leakage Currents in Very Thin Oxides on Silicon
Lenahan, P.M. ; Kang, A.Y. ; Campbell, J.P.
Pub. info.: Proceedings of the Eleventh International Workshop on the Physics of Semiconductor Devices : (December 11-15, 2001).  VOL-1  pp.608-615,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4746