1.

Conference Proceedings
Conference Proceedings
1. Methacrylate resists and antireflective coatings for 193-nm lithography
Taylor, G. N. ; Trefonas, P. ; Szmanda, C. R. ; Barclay, G. G. ; Kavanagh, R. J. ; Blacksmith, R. F. ; Joesten, L. A. ; Monaghan, M. J. ; Coley, S. ; Mao, Z. ; Cameron, J. F. ; Hardy, R. ; Gronbeck, D. ; Connolly, S.
Pub. info.: Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California.  pp.174-185,  1999.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3678
2.

Conference Proceedings
Conference Proceedings
2. Simple method for measuring acid generation quantum efficiency at 193nm
Szmanda, C. R. ; Kavanagh, R. J. ; Bohland, J. R. ; Cameron, J. F. ; Trefonas, P. ; Blacksmith, R. F.
Pub. info.: Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California.  pp.857-866,  1999.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3678
3.

Conference Proceedings
Conference Proceedings
3. Impact of photoacid generator structure on DUV resist performance
Cameron, J. F. ; Ablaza, S. L. ; Xu, G. ; Yueh, W.
Pub. info.: Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California.  pp.785-799,  1999.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3678
4.

Conference Proceedings
Conference Proceedings
4. Exploratory approaches to the study of acid diffusion and acid loss from polymer films using absorption and fluorescence spectroscopy
Coenjarts, C. ; Cameron, J. F. ; Deschamps, N. ; Hambly, D. ; Pohlers, G. ; Scaiano, I. C. ; Sinta, R. F. ; Virdee, S. ; Zampini, A.
Pub. info.: Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California.  pp.1062-1073,  1999.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3678