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Conference Proceedings

1. Noncontact surface potential measurements for charging reduction during TEOS deposition and ion implantation

Cacciato,A. ; Schumbera,P. ; Heessels,A. ; Luchies,I.R.M. ; Swaving,M.

Pub. info.:	In-Line Characterization Techniques for Performance and Yield Enhancement in Microelectronic Manufacturing II :23-24 September 1998 Santa Clara, California. pp.115-124, 1998. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3509

Conference Proceedings

2. Correlating EEPROM end-of-line measurements with PDM in-line charging monitoring for ion implantation

Bloot,A.S. ; Satink,E.H.J. ; Cacciato,A. ; Peuscher,H.J.F. ; Lindeman,J. ; Lowell,J.K.

Pub. info.:	In-Line Characterization Techniques for Performance and Yield Enhancement in Microelectronic Manufacturing II :23-24 September 1998 Santa Clara, California. pp.38-43, 1998. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3509

Conference Proceedings

3. Metal-induced oxide degradation studied by surface photovoltage and mercury-probe measurements

Cacciato,A. ; Evseev,S. ; Vleeshouwers,S. ; Rink,I.

Pub. info.:	Microelectronic Manufacturing Yield, Reliability, and Failure Analysis IV. pp.186-192, 1998. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3510