1.

Conference Proceedings
Conference Proceedings
1. Application of charge-dissipation material in MEBES phase-shift mask fabrication
Z.C.H. Tan ; C. Sauer
Pub. info.: 14th annual Symposium on Photomask Technology and Management : proceedings : 14-16 September 1994, Santa Clara, California.  pp.141-148,  1994.  Bellingham, WA.  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2322
2.

Conference Proceedings
Conference Proceedings
2. PBS resist profile studies for submicron mask lithography
R.L. Dean ; H.Y. Lem ; C. Sauer ; H. Chang
Pub. info.: 14th annual Symposium on Photomask Technology and Management : proceedings : 14-16 September 1994, Santa Clara, California.  pp.102-113,  1994.  Bellingham, WA.  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2322