1.

Conference Proceedings
Conference Proceedings
1. Universal Correlation Between Mobility and NBTI on Advanced High-κ/Metal Gate Stacks
G. Reimbold ; X. Garros ; M. Casse ; M. Rafik ; C. Leroux
Pub. info.: Physics and technology of high-k gate dielectrics 6.  pp.41-53,  2008.  Pennington, NJ.  Electrochemical Society
Title of ser.: ECS transactions
Ser. no.: 16(5)
2.

Conference Proceedings
Conference Proceedings
2. Electrical and Chemical Properties of the HfO2/SiO2/Si Stack: Impact of HfO2 Thickness and Thermal Budget
E. Martinez ; C. Leroux ; N. Benedetto ; C. Gaumer ; M. Charbonnier
Pub. info.: Physics and technology of high-k gate dielectrics 6.  pp.161-169,  2008.  Pennington, NJ.  Electrochemical Society
Title of ser.: ECS transactions
Ser. no.: 16(5)