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Conference Proceedings

1. Photoresist adhesion effect of resist reflow process

J. Park ; J. Lee ; M. Kim ; J. Kim ; S. Lee ; J. Park ; C. Bok ; S. Moon ; S. Park ; J. Hong ; H. Oh

Pub. info.:	Advances in resist materials and processing technology XXIV. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6519

Conference Proceedings

2. Optimization of BARC process for hyper-NA immersion lithography

K. Lee ; J. Lee ; S. Lee ; D. Park ; C. Bok

Pub. info.:	Advances in resist materials and processing technology XXV. 2 pp.69232R-1-69232R-9, 2008. Bellingham, Wash.. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6923

Conference Proceedings

3. Study on the reduction of defects in immersion lithography

K. Ban ; S. Park ; C. Bok ; H. Lim ; J. Heo ; H. Chun ; J. Kang ; S. Moon

Pub. info.:	Advances in resist materials and processing technology XXIV. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6519

Conference Proceedings

4. Optimization of material and process parameter for minimizing defect in implementation of MFHM process

K. Lee ; J. Heo ; K. Ban ; H. Seo ; G. Lee ; W. Kim ; J. Cho ; J. Sun ; S. Lee ; C. Bok ; S. Moon ; J. Kim

Pub. info.:	Advances in resist materials and processing technology XXIV. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6519