1.

Conference Proceedings
Conference Proceedings
1. Characterization of capacitive 3D deep trench mask open structures using scatterometry
S. Zangooie ; P. Herrera ; A. Mesfin ; C. Archie ; M. Sendelbach
Pub. info.: Metrology, inspection, and process control for microlithography XXI.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6518
2.

Conference Proceedings
Conference Proceedings
2. The coming of age of tilt CD-SEM
B. Bunday ; J. Allgair ; E. Solecky ; C. Archie ; N. G. Orji ; J. Beach ; O. Adan ; R. Peltinov ; M. Bar-zvi ; J. Swyers
Pub. info.: Metrology, inspection, and process control for microlithography XXI.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6518
3.

Conference Proceedings
Conference Proceedings
3. Realizing value-added metrology
B. Bunday ; P. Lipscomb ; J. Allgair ; D. Patel ; M. Caldwell ; E. Solecky ; C. Archie ; J. Morningstar ; B. J. Rice ; B. Singh ; J. Cain ; I. Emami ; B. Banke, Jr. ; A. Herrera ; V. Ukraintsev ; J. Schlessinger ; J. Ritchison
Pub. info.: Metrology, inspection, and process control for microlithography XXI.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6518
4.

Conference Proceedings
Conference Proceedings
4. Impact of sampling on uncertainty: semiconductor dimensional metrology applications
B. Bunday ; B. Rijpers ; B. Banke ; C. Archie ; I. B. Peterson
Pub. info.: Metrology, inspection, and process control for microlithography XXII.  1  pp.69220X-1-69220X-22,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6922
5.

Conference Proceedings
Conference Proceedings
5. Characterization of 32nm node BEOL grating structures using scatterometry
S. Zangooie ; M. Sendelbach ; M. Angyal ; C. Archie ; A. Vaid
Pub. info.: Metrology, inspection, and process control for microlithography XXII.  1  pp.69220S-1-69220S-10,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6922