1.

Conference Proceedings
Conference Proceedings
1. Optimized processes and absorber-stack materials for EUV masks
Mathuni, J. ; Rau, J. ; Kamm, F. -M. ; Ruhl, G. G. ; Holfeld, Ch. ; Letzkus, F. ; Kopernik, C. ; Butschke, J.
Pub. info.: 20th European Conference on Mask Technology for Integrated Circuits and Microcomponents.  pp.105-110,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5504
2.

Conference Proceedings
Conference Proceedings
2. Avoidance/reduction of charging effects in case of partially insufficient substrate conductivity when using ESPACER 300Z
Plontke, R. ; Bettin, L. ; Beyer, D. ; Butschke, J. ; Irmscher, M. ; Koepernik, C. ; Leibold, B. ; Vix, A. B. E. ; Voehringer, P.
Pub. info.: 20th European Conference on Mask Technology for Integrated Circuits and Microcomponents.  pp.188-196,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5504
3.

Conference Proceedings
Conference Proceedings
3. Patterning performance of most recent e-beam-sensitive CARs for advanced mask making: an update
Schwersenz, A. ; Butschke, J. ; Feicke, A. ; Irmscher, M. ; Voehringer, P.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.201-212,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567
4.

Conference Proceedings
Conference Proceedings
4. NIL template manufacturing using a variable. shaped e-beam writer and a new pCAR [6151-42]
Irmscher, M. ; Butschke, J. ; Hess, G. ; Koepernik, C. ; Letzkus, F. ; Renno, M. ; Sailer, H. ; Schulz, H. ; Schwersenz, A. ; Thompson, E.
Pub. info.: Emerging Lithographic Technologies X.  pp.615115-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6151
5.

Conference Proceedings
Conference Proceedings
5. EUVL mask manufacturing: technologies and results [5992-83]
Letzkus, F. ; Butschke, J. ; Irmscher, M. ; Sailer, H. ; Dersch, U. ; Holfield, C.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.59922A-,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992
6.

Conference Proceedings
Conference Proceedings
6. Measures to achieve 20-nm IPL stenecil mask distortion
Hougeneder, E. ; Chalupka A. ; Lammer, T. ; Loeschner, H. ; Kamm, F.-M. ; Struck, T. ; Ehrmann, A. ; Kaesmaier, R. ; Wolter, A. ; Butschke, J. ; Irmscher, M. ; Letzkus, F. ; Springer, R.
Pub. info.: 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents.  pp.23-31,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4764
7.

Conference Proceedings
Conference Proceedings
7. Comparative study of mask architectures for EUV lithography
Pawloski, A. R. ; La Fontaine, B. ; Levinson, H. J. ; Hirscher, S. ; Schwarzl, S. ; Lowack, K. ; Kamm, F. -M. ; Bender, M. ; Domke, W. -D. ; Holfeld, C. ; Dersch, U. ; Naulleau, P. ; Letzkus, F. ; Butschke, J.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.762-773,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567
8.

Conference Proceedings
Conference Proceedings
8. Template manufacturing for nanoimprint lithography using existing infrastructure [5992-87]
Irmscher, M. ; Butschke, J. ; Hess, G. ; Letzkus, F. ; Renno, M. ; Sailer, H. ; Schulz, H. ; Schwersenz, A. ; Thompson, E. ; Vratzov, B.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.59922E-,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992
9.

Conference Proceedings
Conference Proceedings
9. Determination of mask layer stress by placement metrology [5992-130]
Butschke, J. ; Buttgereit, U. ; Cotte, E. ; Hess, G. ; Irmscher, M. ; Seitz, H.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.59923U-,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992
10.

Conference Proceedings
Conference Proceedings
10. Comparative evaluation of e-beam sensitive chemically amplifild resists for mask making
Irmscher, M. ; Beyer, D. ; Butschke, J. ; Constantine, C. ; Hoffmann, T. ; Koepernik, C. ; Krauss, C. ; Leibold, B. ; Letzkus, F. ; Mueller, D. ; Springer, R. ; Voehringer, P.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology IX.  pp.176-187,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4754