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Conference Proceedings

1. Review and characterization of defects after automatic optical inspection on patterned wafers

Bichebois,P. ; Perret,P. ; Martin,H.M. ; Brun,A. ; Burlet,D.

Pub. info.:	Metrology, Inspection, and Process Control for Microlithography X. pp.261-272, 1996. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2725

Conference Proceedings

2. In-line overlay measurements for advanced photolithography

Rouchouze,E. ; Burlet,D. ; Dumant,J.-M.

Pub. info.:	Metrology, Inspection, and Process Control for Microlithography X. pp.331-344, 1996. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2725