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12 results

Conference Proceedings

1. Mask data volume: historical perspective and future requirements [6281-21]

Spense, C. ; Goad, S. ; Buck, P. ; Gladhill, R. ; Cinque, R. ; Preuninger, J. ; Griesinger, U ; Blocker, M.

Pub. info.:	EMLC 2006 : 22nd European Mask and Lithography Conference : 23-26 January 2006, Dresden, Germany. pp.62810H-, 2006. Bellingham, Wash.,. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6281

Conference Proceedings

2. Layout and source dependent transmission tuning

Kiefer, R. ; Jackson, C. ; Garg, V. ; Mellenthin, D. ; Manfredo, J. ; Buck, P. ; Cohen, S. ; Morgante, C. ; Allen, P. C. ; White, M.

Pub. info.:	Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA. pp.315-326, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5754

Conference Proceedings

3. Experimental characterization of constituent errors in electron-beam lithography [6283-17]

Cinque, R. ; Buck, P. ; Yei, S. K. ; Komagata, T. ; Nakagawa, Y.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology XIII. pp.62831M-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6283

Conference Proceedings

4. Print characterization of photomasks from next-generation deep-ultra-violet laser pattern generator [5853-133]

Jackson, C. ; Kiefer, R. ; Buck, P. ; Mellenthin, D. ; Manfredo, J. ; Garg, V. ; Hickethier, J. ; Cohen, S. ; Morgante, C. ; Allen, P. C. ; Christenson, E. ; White, M.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology XII. pp.387-397, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5853

Conference Proceedings

5. Mask data volume: explosion or damp squib- [5992-38]

Spence, C. ; Good, S. ; Buck, P. ; Gladhill, R. ; Cinque, R.

Pub. info.:	25th Annual BACUS Symposium on Photomask Technology. pp.599211-599211, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5992

Conference Proceedings

6. Pattern fidelity performance from next-generation DUV laser lithography on 6Snm masks and wafers [5992-31]

Kiefer, R. ; Buck, P. ; Garg, V. ; Hickethier, J. ; Jackson, C. ; Manfredo, J. ; Morgante, C. ; Allen, P. ; White, M.

Pub. info.:	25th Annual BACUS Symposium on Photomask Technology. pp.59920U-, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5992

Conference Proceedings

7. A mask manufacturer’s perspective on maskless lithography [5992-78]

Buck, P. ; Biechler Consulting (USA) ; Toppan Photomasks Inc. (USA)

Pub. info.:	25th Annual BACUS Symposium on Photomask Technology. pp.599225-599225, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5992

Conference Proceedings

8. DUV laser lithography for photomask fabrication

Jackson, C.A. ; Buck, P. ; Cohen, S. ; Garg, V. ; Howard, C. ; Kiefer, R. ; Manfredo, J. ; Tsou, J.

Pub. info.:	23rd Annual BACUS Symposium on Photomask Technology. pp.30-41, 2003. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5256

Conference Proceedings

9. DUV mask writer for BEOL 90-nm technology layers

Hong, D. ; Krishnan, P. ; Coburn, D. ; Jeewakhan, N. ; Xie, S. ; Broussard, J. ; Ferguson, B. ; Green, K.G. ; Buck, P. ; Jackson, C.A. ; Martinez, L.

Pub. info.:	23rd Annual BACUS Symposium on Photomask Technology. pp.9-19, 2003. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5256

10.

Conference Proceedings

10. DUV laser lithography for photomask fabrication

Jackson, C.A. ; Buck, P. ; Cohen, S. ; Garg, V. ; Howard, C. ; Kiefer, R.M. ; Manfredo, J. ; Tsou, J.

Pub. info.:	Optical Microlithography XVII. pp.1005-1016, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5377

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Author: Buck, P.