1.

Conference Proceedings
Conference Proceedings
1. 157-nm technology: Where are we today?
Mulkens, J. ; Fahey, T.J. ; McClay, J.A. ; Stoeldraijer, J.M. ; Wong, P. ; Brunotte, M. ; Mecking, B.
Pub. info.: Optical Microlithography XV.  Part One  pp.613-625,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
2.

Conference Proceedings
Conference Proceedings
2. Optical lithography solutions for sub-65-nm semiconductor devices
Mulkens, J. ; McClay, J.A. ; Tirri, B.A. ; Brunotte, M. ; Mecking, B. ; Jasper, H.
Pub. info.: Optical Microlithography XVI.  Part Two  pp.753-762,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
3.

Conference Proceedings
Conference Proceedings
3. Optical lithography with 157-nm technology
Modderman, T.M. ; Jasper, H. ; Boom, H. ; Uitterdijk, T. ; Dana, S. ; Sewell, H. ; O'Neil, T.K. ; Mulkens, J. ; Brunotte, M. ; Mecking, B. ; Gruner, T.
Pub. info.: Optical Microlithography XVII.  pp.816-826,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377