1.

Conference Proceedings
Conference Proceedings
1. Extension of 248-nm optical lithography: a thin film imaging approach
Lin,Q. ; Katnani,A.D. ; Brunner,T.A. ; DeWan,C. ; Fairchok,C. ; LaTulipe,D.C.,Jr. ; Simons,J.P. ; Petrillo,K.E. ; Babich,K. ; Seeger,D.E. ; Angelopoulos,M. ; Soonyakumaran,R. ; Wallraff,G.M. ; Hofer,D.C.
Pub. info.: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 1  pp.278-288,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3333
2.

Conference Proceedings
Conference Proceedings
2. Characterization of linewidth variation
Wong,A.K. ; Molless,A.F. ; Brunner,T.A. ; Coker,E. ; Fair,R.H. ; Mack,G.L. ; Mansfield,S.M.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part1  pp.184-191,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
3.

Conference Proceedings
Conference Proceedings
3. Characterization of linewidth variation on 248- and 193-nm exposure tools
Gabor,A.H. ; Brunner,T.A. ; Chen,J. ; Chen,N. ; Deshpande,S. ; Ferguson,R.A. ; Horak,D.V. ; Holmes,S.J. ; Liebmann,L.W. ; Mansfield,S.M. ; Molless,A.F. ; Progler,C.J. ; Rabidoux,P.A. ; Ryan,D. ; Talvi,P. ; Tsou,L. ; Vampatella,B.R. ; Wong,A.K. ; Yang,Q. ; Yu,C.
Pub. info.: Optical Microlithography XIV.  4346  pp.259-264,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
4.

Conference Proceedings
Conference Proceedings
4. High-NA swing curve effects
Brunner,T.A. ; Gabor,A.H. ; Wu,C.J. ; Chen,N.
Pub. info.: Optical Microlithography XIV.  4346  pp.1050-1057,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
5.

Conference Proceedings
Conference Proceedings
5. Optimum tone for various feature types: positive versus negative
Brunner,T.A. ; Fonseca,C.A.
Pub. info.: Advances in Resist Technology and Processing XVIII.  4345  pp.30-36,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4345
6.

Conference Proceedings
Conference Proceedings
6. Measurement of microlithography aerial image quality
Kirk,J.P. ; Brunner,T.A.
Pub. info.: Optical Microlithography IX.  Part1  pp.410-416,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2726
7.

Conference Proceedings
Conference Proceedings
7. Approximate models for resist processing effects
Brunner,T.A. ; Ferguson,R.A.
Pub. info.: Optical Microlithography IX.  Part1  pp.198-207,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2726
8.

Conference Proceedings
Conference Proceedings
8. Simulations and experiments with the phase-shift focus monitor
Brunner,T.A. ; Mih,R.D.
Pub. info.: Optical Microlithography IX.  Part1  pp.236-243,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2726