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22 results

Conference Proceedings

1. Interferometric lithography pattern delimited by a mask image

Chen,X. ; Frauenglass,A. ; Brueck,S.R.J.

Pub. info.:	Emerging lithographic technologies II : 23-25 February 1998, Santa Clara, California. pp.496-502, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3331

Conference Proceedings

2. Thermal poling and space charge dynamics including surface impurity injection in fused silica

Alley,T.G. ; Brueck,S.R.J. ; Wiedenbeck,M.

Pub. info.:	Doped fiber devices II : 2-3 November, 1998, Boston, Massachusetts. pp.108-114, 1998. Bellingham, Washington. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3542

Conference Proceedings

3. Nanoscale fabrication by interferometric lithography

Zaidi,S.H. ; Brueck,S.R.J.

Pub. info.:	Optical engineering for sensing and nanotechnology (ICOSN '99) : 16-18 June 1999, Yokohama, Japan. pp.340-343, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3740

Conference Proceedings

4. Interferometric lithography for nanoscale fabrication

Zaidi,S.H. ; Brueck,S.R.J.

Pub. info.:	Laser applications in microelectronic and optoelectronic manufacturing IV : 25-27 January 1999, San Jose, California. pp.2-8, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3618

Conference Proceedings

5. Mix-and-match interferometric and optical lithographies for nanoscale structures

Zaidi,S.H. ; Brueck,S.R.J. ; Hill,T.A. ; Shagam,R.N.

Pub. info.:	Emerging lithographic technologies II : 23-25 February 1998, Santa Clara, California. pp.406-413, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3331

Conference Proceedings

6. Imaging interferometric lithography for arbitrary patterns

Chen,X. ; Brueck,S.R.J.

Pub. info.:	Emerging lithographic technologies II : 23-25 February 1998, Santa Clara, California. pp.214-224, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3331

Conference Proceedings

7. Imaging interferometric lithography:extending optics to fundamental limits and beyond

Brueck,S.R.J.

Pub. info.:	18th Congress of the International Commission for Optics : Optics for the next millennium : 2-6 August, 1999, San Francisco, California. pp.360-361, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3749

Conference Proceedings

8. Image reversal at nanometer scales

Zaidi,S.H. ; Chen,X. ; Brueck,S.R.J.

Pub. info.:	Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California. Part 2 pp.1272-1279, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3333

Conference Proceedings

9. Periodic arrays of pinning centers in thin vanadium films

Metlushko,V. ; Welp,U. ; Crabtree,C. ; Zhang,Z. ; Brueck,S.R.J. ; Watkins,B. ; DeLong,L.E. ; llic,B. ; Chung,K. ; Hesketh,P.J.

Pub. info.:	Superconducting superlattices II, native and artificial : 20-22 July 1998, San Diego, California. pp.149-159, 1998. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3480

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Conference Proceedings

10. Interferometric lithography exposure tool for 180-nm structures

Zaidi,S.H. ; Brueck,S.R.J. ; Schellenberg,F.M. ; Mackay,R.S. ; Uekert,K. ; Persoff,J.J.

Pub. info.:	Emerging lithographic technologies : 10-11 March 1997, Santa Clara, California. pp.248-254, 1997. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3048

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