1.

Conference Proceedings
Conference Proceedings
1. Optical emission endpoint optimization in the tetra etch chamber for production of embedded phase-shift photomasks
Brooks, C.B. ; Anderson, S. ; Anderson, R.B. ; Collard, C. ; Clevenger, J. ; Sandlin, N.L. ; Buie, M.J.
Pub. info.: 19th European Conference on Mask Technology for Integrated Circuits and Microcomponents.  pp.235-243,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5148
2.

Conference Proceedings
Conference Proceedings
2. Optimizing etch uniformity for alternating aperture phase-shift masks on Etec Systems Tetra photomask etch system
Waheed, N.L. ; Brooks, C.B.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part One  pp.592-598,  2002.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
3.

Conference Proceedings
Conference Proceedings
3. Process monitoring of etched fused silica phase-shift reticles
Brooks, C.B. ; Buie, M.J. ; Waheed, N.L. ; Martin, P.M. ; Walsh, P. ; Evans, G.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part One  pp.25-31,  2002.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
4.

Conference Proceedings
Conference Proceedings
4. Integrated phase shift measurements for advanced mask etch process control
Sahin, T. ; Collard, C. ; Anderson, S.A. ; Mak, A.W. ; Brooks, C.B. ; Buie, M.J. ; Walsh, P. ; Li, G.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.76-84,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256
5.

Conference Proceedings
Conference Proceedings
5. Optimization of chrome dry etch in Tetra II using asymmetrically loaded patterns
Brooks, C.B. ; Anderson, R.B., III ; Clevenger, J.O. ; Collard, C. ; Halim, M. ; Sahin, T. ; Mak, A.W.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.749-757,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256
6.

Conference Proceedings
Conference Proceedings
6. Examination of various endpoint methods for chrome mask etch
Collard, C. ; Anderson, S.A. ; Anderson, R.B., III ; Clevenger, J.O. ; Halim, M. ; Brooks, C.B. ; Buie, M.J. ; Sahin, T.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.744-748,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256