1.

Conference Proceedings
Conference Proceedings
1. Vendor capability for low-thermal-expansion mask substrates for EUV lithography
Blaedel, K.L. ; Taylor, J.S. ; Hector, S.D. ; Yan, P.Y. ; Ramamoorthy, A. ; Brooker, P.D.
Pub. info.: Emerging Lithographic Technologies VI.  Part Two  pp.767-778,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4688
2.

Conference Proceedings
Conference Proceedings
2. Fourier optic imaging equations for the immersion case
Brooker, P.D.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.851-858,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256
3.

Conference Proceedings
Conference Proceedings
3. 157-nm alternating phase-shifting mask design and high-NA images
Chen, Y.-T. ; Meute, J. ; Dean, K. ; Brooker, P.D.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.905-912,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256