1.

Conference Proceedings
Conference Proceedings
1. ArF solutions for low-k1 back-end imaging
Wiaux, V. ; Montgomery, P.K. ; Vandenberghe, G. ; Monnoyer, P. ; Ronse, K.G. ; Conley, W. ; Litt, L.C. ; Lucas, K. ; Finders, J. ; Socha, R. ; Broeke, D.J.V.D.
Pub. info.: Optical Microlithography XVI.  Part One  pp.270-281,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
2.

Conference Proceedings
Conference Proceedings
2. Application of CPL reticle technology for the 65- and 50-nm node
Conley, W. ; Broeke, D.J.V.D. ; Socha, R.J. ; Wu, W. ; Litt, L.C. ; Lucas, K. ; Nelson-Thomas, C.M. ; Roman, B.J. ; Chen, F. ; Wampler, K.E. ; Laidig, T.L. ; Hsu, S.D. ; Schaefer, E. ; Cassel, S. ; Yu, L. ; Kasprowicz, B.S. ; Progler, C.J. ; Petersen, J.S. ; Gerold, D.J. ; Maslow, M.J.
Pub. info.: Optical Microlithography XVI.  Part One  pp.392-398,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
3.

Conference Proceedings
Conference Proceedings
3. 65-nm full-chip implementation using double dipole lithography
Hsu, S.D. ; Chen, J.F. ; Cororan, N. ; Knose, W.T. ; Broeke, D.J.V.D. ; Laidig, T.L. ; Wampler, K.E. ; Shi, X. ; Hsu, C.M. ; Eurlings, M. ; Finders, J. ; Chiou, T.-B. ; Socha, R.J. ; Conley, W. ; Hsieh, Y.W. ; Tuan, S. ; Hsieh, F.
Pub. info.: Optical Microlithography XVI.  Part One  pp.215-231,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040