1.

Conference Proceedings
Conference Proceedings
1. Impact of process variation on 65nm across-chip Iinewidth variation [6156-64]
Hong, L. ; Brist, T. ; LaCour, P. ; Sturtevant, J. ; Niehoff, M. ; Niedermaier, P.
Pub. info.: Design and process integration for microelectronic manufacturing IV : 23-24 February, 2006, San Jose, California, USA.  pp.61560Q-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6156
2.

Conference Proceedings
Conference Proceedings
2. Integrating RET and mask manufacturability in memory designs for local interconnect for sub-100nm trenches
Kachwala, N. ; Iandolo, W. ; Brist, T. ; Farnbach, R.
Pub. info.: Design and process integration for microelectronic manufacturing III : 3-4 March 2005, San Jose, California, USA.  pp.141-149,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5756
3.

Conference Proceedings
Conference Proceedings
3. Integrated post tape outflow for fast design to mask turn-around time [5992-172]
Hung, C. -Y. ; Liu, Q. ; Zhang, L. ; Shang, S. ; Bailey, G. E. ; Jost, A. ; Brist, T.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.599251-599251,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992
4.

Conference Proceedings
Conference Proceedings
4. Model-based insertion and optimization of assist features with application to contact layers [5992-71]
Shang, S. D. ; Granik, Y. ; Swallow, L. ; Zhang, L. ; Brist, T. ; Torres, A. ; Hung, C. ; Liu, Q.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.59921Y-,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992
5.

Conference Proceedings
Conference Proceedings
5. Source polarization and OPC effects on illumination optimization [5992-103]
Brist, T. ; Bailey, G. E. ; Drozdov, A. ; Torres, A. ; Estroff, A. ; Hendrickx., E.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.599232-599232,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992
6.

Conference Proceedings
Conference Proceedings
6. Reverse engineering source polarization error [5992-105]
Bailey, G. E. ; Adam, K. ; Brist, T. ; Toublan, O. ; Estroff, A.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.599234-599234,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992