1.

Conference Proceedings
Conference Proceedings
1. Multiple-nonvolatile acetal (MANA) resists
Guevremont,J.M. ; Brainard,R.L. ; Reeves,S.D. ; Zhou,X. ; Nguyen,T.B. ; Mackevich,J.F. ; Anderson,E.H. ; Taylor,G.N.
Pub. info.: Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA.  pp.255-267,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4343
2.

Conference Proceedings
Conference Proceedings
2. Ultrathin photoresists for EUV lithography
Rao,V. ; Cobb,J.L. ; Henderson,C.C. ; Okoroanyanwu,U. ; Bozman,D.R. ; Mangat,P.J. ; Brainard,R.L. ; Mackevich,J.
Pub. info.: Emerging lithographic technologies III : 15-17 March 1999, Santa Clara, California.  Part2  pp.615-626,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3676
3.

Conference Proceedings
Conference Proceedings
3. Optimization of DUV chemically amplified resist platforms for SCALPEL e-beam exposure
Ocola,L.E. ; Blakey,M.I. ; Orphanos,P.A. ; Li,W.-Y. ; Novembre,A.E. ; Brainard,R.L. ; Mackevich,J.F. ; Taylor,G.N.
Pub. info.: Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA.  pp.194-203,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3997