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10 results

Conference Proceedings

1. Optimization of nanomachining repair condition for ArF lithography

Amano, T. ; Nishiguchi, M. ; Hashimoto, H. ; Morikawa, Y. ; Hayashi, N. ; White, R. ; Bozak, R. ; Terrill, L.

Pub. info.:	23rd Annual BACUS Symposium on Photomask Technology. pp.538-545, 2003. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5256

Conference Proceedings

2. Integration of photolithographic simulation and a mask repair system into a single concurrent work cell [5992-50]

Robinson, T. ; Brooker, P. ; Bozak, R. ; Lee, D. A.

Pub. info.:	25th Annual BACUS Symposium on Photomask Technology. pp.59921D-, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5992

Conference Proceedings

3. Precise and high-throughput femtopulse laser mask repair of large defects [6349-171]

White, R. ; LeClaire, J. ; Robinson, T. ; Dinsdale, A. ; Bozak, R. ; Lee, D. A.

Pub. info.:	Photomask Technology 2006. pp.63494F-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6349

Conference Proceedings

4. Defect repair performance using the nanomachining repair technique

Morikawa, Y. ; Kokubo, H. ; Nishiguchi, M. ; Hayashi, N. ; White, R. ; Bozak, R. ; Terrill, L.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology X. pp.520-527, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5130

Conference Proceedings

5. Mask repair for the 65 nm technology node [5992-171]

Robinson, T. ; Dinsdale, A. ; Bozak, R. ; White, R. ; Lee, D. A. ; Roessler, K.

Pub. info.:	25th Annual BACUS Symposium on Photomask Technology. pp.59924Z-, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5992

Conference Proceedings

6. Investigation of nanomachining as a technique for geometry reconstruction

Brinkley, D. ; Bozak, R. ; Chiu, B. ; Ly, C. ; Tolani, V. ; White, R.

Pub. info.:	22nd Annual BACUS Symposium on Photomask Technology. Part One pp.232-240, 2002. Bellingham, WA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4889

Conference Proceedings

7. Use of nanomachining for subtractive repair of EUV and other challenging mask defects

Brinkley, D. ; White, R. ; Bozak, R. ; Liang, T. ; Liu, G.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology IX. pp.900-911, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4754

Conference Proceedings

8. Application of photolithographic simulation and a mask repair system in a production environment [6283-45]

Robinson, T. ; Lewellen, J. ; Bozak, R. ; Lee, A. D. ; Brooker, P.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology XIII. pp.62832B-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6283

Conference Proceedings

9. Femtopulse laser-based mask repair in the DUV wavelength regime [6283-43]

Ghadiali, F. ; Tolani, V. ; Nagpal, R. ; Robinson, T. ; LeClaire, J. ; Bozak, R. ; Lee, A. D. ; White, R.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology XIII. pp.628329-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6283

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Conference Proceedings

10. Improved cycle time of mask repair by optimizing nanomachining with photolithographic imaging simulation [5853-90]

Brooker, P. ; Robinson, T. ; Lewellen, J. ; Naber, B. ; Bozak, R. ; Lee, D. A. ; RAVE LLC (USA)

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology XII. pp.1009-1020, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5853

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Author: Bozak, R.