1.

Conference Proceedings
Conference Proceedings
1. CD-SEM image acquisition effects on 193-nm resists line slimming
Sullivan, N.T. ; Mastovich, M.E. ; Bowdoin, S. ; Brandom, R.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVII.  1  pp.618-623,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5038
2.

Conference Proceedings
Conference Proceedings
2. 193-nm resist: ultralow voltage CD-SEM performance for sub-130-nm contact hole process
Ferri, J.E. ; Vieira, M. ; Reybrouck, M. ; Mastovich, M.E. ; Bowdoin, S. ; Brandom, R. ; Knutrud, P.C.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVII.  1  pp.608-617,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5038
3.

Conference Proceedings
Conference Proceedings
3. Minimization of image placement errors in chromeless phase-shift mask lithography
Fritze, M. ; Tyrrell, B. ; Cann, S.G. ; Carney, C. ; Blachowicz, B.A. ; Brzozowy, D. ; Kocab, T. ; Bowdoin, S. ; Rhyins, P.D. ; Progler, C.J. ; Martin, P.
Pub. info.: Optical Microlithography XV.  Part One  pp.426-436,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691