1.

Conference Proceedings
Conference Proceedings
1. Optimizing a DUV positive resist for metal layers
Malik, S. ; Maxwell, B. ; Gandolfi, A. ; Ornaghi, A. ; Whewell, A. ; Uhnak, K. ; Volpi, S. ; Driessche, V. Van ; Sarubbi, T. R. ; Hansen, S. G. ; Bowden, M. J.
Pub. info.: Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California.  pp.527-535,  1999.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3678
2.

Conference Proceedings
Conference Proceedings
2. Lithographic properties of novel acetal-derivatized hydroxy styrene polymers
Malik, S. ; Blakeney, A. J. ; Ferreira, L. ; Maxwell, B. ; Whewell, A. ; Sarubbi, T. R. ; Bowden, M. J. ; Driessche, V. Van ; Fujimori, T. ; Tan, S. ; Aoai, T. ; Uenishi, K. ; Kawabe, Y. ; Kokubo, T.
Pub. info.: Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California.  pp.388-401,  1999.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3678
3.

Conference Proceedings
Conference Proceedings
3. Resist Processing
Thompson, L. F. ; Bowden, M. J.
Pub. info.: Introduction to microlithography : theory, materials, and processing.  pp.161-,  1983.  Washington, D.C..  American Chemical Society
Title of ser.: ACS symposium series
Ser. no.: 219
4.

Conference Proceedings
Conference Proceedings
4. The Lithographic Process: The Physics
Thompson, L. F. ; Bowden, M. J.
Pub. info.: Introduction to microlithography : theory, materials, and processing.  pp.15-,  1983.  Washington, D.C..  American Chemical Society
Title of ser.: ACS symposium series
Ser. no.: 219
5.

Conference Proceedings
Conference Proceedings
5. Initiation Considerations and Kinetics of Formation of Poly(2-methyl-1-pentene sulfone)
Bowden, M. J. ; Novembre, T.
Pub. info.: Initiation of polymerization : based on a symposium.  pp.125-,  1983.  Washington, D.C..  American Chemical Society
Title of ser.: ACS symposium series
Ser. no.: 212
6.

Conference Proceedings
Conference Proceedings
6. A Perspective on Resist Materials for Fine-Line Lithography
Bowden, M. J.
Pub. info.: Materials for microlithography : radiation-sensitive polymers.  pp.39-,  1984.  Washington, D.C..  American Chemical Society
Title of ser.: ACS symposium series
Ser. no.: 266
7.

Conference Proceedings
Conference Proceedings
7. Synthesis, Characterization, and Lithographic Evaluation of Chlorinated Polymethylstyrene
Tarascon, R. ; Hartney, M. ; Bowden, M. J.
Pub. info.: Materials for microlithography : radiation-sensitive polymers.  pp.361-,  1984.  Washington, D.C..  American Chemical Society
Title of ser.: ACS symposium series
Ser. no.: 266