1.

Conference Proceedings
Conference Proceedings
1. PERFORMANCE OF 'DDC': DILUTED DYNAMIC CLEAN BEFORE 4.5 nm GATE OXIDE
Boelen, P. ; Matthews, R. ; Kashkoush, I. ; Novak, R.
Pub. info.: Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.15-22,  1997.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 97-35
2.

Conference Proceedings
Conference Proceedings
2. EVALUATION OF ADVANCED PRE-GATE CLEANINGS
Cowache, C. ; Boelen, P. ; Kashkoush, I. ; Besson, P. ; Tardif, F.
Pub. info.: Cleaning technology in semiconductor device manufacturing : proceedings of the sixth international symposium.  pp.59-68,  1999.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 99-36
3.

Conference Proceedings
Conference Proceedings
3. Advanced processes for photomask damage-free cleaning and photoresist removal [6281-26]
Papanu, S. J. ; Gouk, R. ; Chen, -W. H. ; Boelen, P. ; Peters, P. ; Belisle, M. ; Verhaverbeke, S. ; Ko, A. ; Child, K. ; Martinez, E.
Pub. info.: EMLC 2006 : 22nd European Mask and Lithography Conference : 23-26 January 2006, Dresden, Germany.  pp.62810K-,  2006.  Bellingham, Wash.,.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6281
4.

Conference Proceedings
Conference Proceedings
4. HF CONCENTRATION OF CONTROL IN IC MANUFACTURING
Kashkoush, Ismail ; Chen, G. ; Boelen, P. ; Geomini, M.
Pub. info.: Cleaning technology in semiconductor device manufacturing : proceedings of the sixth international symposium.  pp.252-257,  1999.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 99-36
5.

Conference Proceedings
Conference Proceedings
5. OPTIMIZATION OF DILUTE SC1
Boelen, P. ; Lardin, T. ; Sandrier, B. ; Matthews, R. ; Kashkoush, I. ; Novak, R. ; Tardif, F.
Pub. info.: Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.161-167,  1997.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 97-35
6.

Conference Proceedings
Conference Proceedings
6. AQUEOUS SINGLE PASS SINGLE WAFER AI/VIA CLEANING
Verhaverbeke, S. ; Beaudry, C. ; Boelen, P.
Pub. info.: Cleaning technology in semiconductor device manufacturing VIII : proceedings of the international symposium.  pp.23-26,  2003.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-26
7.

Conference Proceedings
Conference Proceedings
7. Advanced mask cleaning techniques for sub-100-nm technology nodes [5992-53]
Papanu, J. S. ; Gouk, R. ; Franklin, C. ; Chen, H. -W. ; Verhaverbeke, S. ; Ko, A. ; Child, K. ; Boelen, P. ; Shrauti, S. ; Martinez, E. ; Brown, B. J.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.59921G-,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992