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Conference Proceedings

1. Determination of optical properties of thin films and surfaces in 157-nm lithography

Liberman,V. ; Bloomstein,T.M. ; Rothschild,M.

Pub. info.:	Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California. pp.480-491, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3998

Conference Proceedings

2. Mechanical distortions in advanced optical reticles

Mikkelson,A.R. ; Engelstad,R.L. ; Lovell,E.G. ; Bloomstein,T.M. ; Mason,M.E.

Pub. info.:	Emerging lithographic technologies III : 15-17 March 1999, Santa Clara, California. Part2 pp.744-755, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3676

Conference Proceedings

3. Thermomechanical distortions of advanced optical reticles during exposure

Chang,J. ; Abdo,A. ; Kim,B. ; Bloomstein,T.M. ; Engelstad,R.L. ; Lovell,E.G. ; Beckman,W.A. ; Mitchell,J.W.

Pub. info.:	Emerging lithographic technologies III : 15-17 March 1999, Santa Clara, California. Part2 pp.756-767, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3676

Conference Proceedings

4. Laser cleaning of optical elements in 157-nm lithography

Bloomstein,T.M. ; Rothschild,M. ; Liberman,V. ; Hardy,D.E. ; Efremow,N.N.,Jr. ; Palmacci,S.T.

Pub. info.:	Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA. Part2 pp.1537-1545, 2000. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4000

Conference Proceedings

5. Interference lithography at 157 nm

Switkes,M. ; Bloomstein,T.M. ; Rothschild,M.

Pub. info.:	Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA. Part2 pp.1590-1593, 2000. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4000

Conference Proceedings

6. Optical materials and coatings at 157 nm

Bloomstein,T.M. ; Liberman,V. ; Rothschild,M. ; Hardy,D.E. ; Goodman,R.B.

Pub. info.:	Emerging lithographic technologies III : 15-17 March 1999, Santa Clara, California. Part1 pp.342-349, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3676

Conference Proceedings

7. Laser micromachining of silicon: a new technique for fabricating terahertz imaging arrays

Walker,C.K. ; Hungerford,A.L. ; Narayanan,G. ; Groppi,C. ; Bloomstein,T.M. ; Palmacci,S.T. ; Stern,M.B. ; Curtin,J.E.

Pub. info.:	Advanced technology MMW, radio, and terahertz telescopes : 26-28 March 1998, Kona, Hawaii. pp.45-52, 1998. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3357

Conference Proceedings

8. Controlled contamination of optics under 157-nm laser irradiation

Bloomstein,T.M. ; Liberman,V. ; Palmacci,S.T. ; Rothschild,M.

Pub. info.:	Optical Microlithography XIV. 4346 pp.685-694, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4346

Conference Proceedings

9. UV cleaning of contaminated 157-nm reticles

Bloomstein,T.M. ; Liberman,V. ; Rothschild,M. ; Efremow Jr.,N.N. ; Hardy,D.E. ; Palmacci,S.T.

Pub. info.:	Optical Microlithography XIV. 4346 pp.669-675, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4346

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Conference Proceedings

10. Photoresist outgassing at 157-nm exposure

Hien,S. ; Angood,S. ; Ashworth,D. ; Basset,S. ; Bloomstein,T.M. ; Dean,K.R. ; Kunz,R.R. ; Miller,D.A. ; Patel,S. ; Rich,G.K.

Pub. info.:	Advances in Resist Technology and Processing XVIII. 4345 pp.439-447, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4345

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