1.

Conference Proceedings
Conference Proceedings
1. SCALPEL mask blank fabrication
Saunders,T.E. ; Blakey,M.I. ; Caminos,C. ; Bogart,G.R. ; Farrow,R.C. ; Knurek,C.S. ; Kornblit,A. ; Liddle,J.A. ; Novembre,A.E. ; Peabody,M.L.
Pub. info.: Micromachining and microfabrication process technology V : 20-22 September, 1999, Santa Clara, California.  pp.248-255,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3874
2.

Conference Proceedings
Conference Proceedings
2. Cleaning of SCALPEL next-generation Lithography masks using PLASMAX,a revolutionary dry cleaning technology
Festa,J.J. ; Novembre,A.E. ; Bennett,D.A. ; Kasica,R.J. ; Bailey,B. ; Blakey,M.I.
Pub. info.: 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California.  Part2  pp.916-926,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3873
3.

Conference Proceedings
Conference Proceedings
3. Phase-mask effects by dark-field lithography
White,D.L. ; Cirelli,R.A. ; Spector,S.J. ; Blakey,M.I. ; II,O.R.Wood
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part1  pp.366-372,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
4.

Conference Proceedings
Conference Proceedings
4. Defect inspection and linewidth measurement of SCALPEL thin membrane masks using optical transmission
Farrow,R.C. ; Blakey,M.I. ; Kasica,R.J. ; Liddle,J.A. ; Mkrtchyan,M.M. ; Novembre,A.E. ; Peabody,M.L. ; Saunders,T.E. ; Windt,D.L. ; Zurbrick,L.S. ; Wiley,J.N. ; Aquino,C. ; Hentschel,S.L. ; Davis,L.C. ; Boyer,B.
Pub. info.: Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California.  pp.221-231,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3332
5.

Conference Proceedings
Conference Proceedings
5. 200-mm SCALPEL mask development
Bogart,G.R. ; Novembre,A.E. ; Kornblit,A. ; Peabody,M.L. ; Farrow,R.C. ; Blakey,M.I. ; Kasica,R.J. ; Liddle,J.A. ; Saunders,T.E. ; Knurek,C.S. ; Johnston,I.
Pub. info.: Emerging lithographic technologies III : 15-17 March 1999, Santa Clara, California.  Part1  pp.171-177,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3676
6.

Conference Proceedings
Conference Proceedings
6. Alignment mark detection in CMOS materials with SCALPEL e-beam lithography
Farrow,R.C. ; Waskiewicz,W.K. ; Kizilyalli,I.C. ; Callatin,G.M. ; Liddle,J.A. ; Mkrtchyan,M.M. ; Kornblit,A. ; Ocola,L.E. ; Klemens,F.P. ; Felker,J.A. ; Biddick,C.J. ; Kraus,J.S. ; Blakey,M.I. ; Orphanos,P. ; Merchant,S.M.
Pub. info.: Emerging lithographic technologies III : 15-17 March 1999, Santa Clara, California.  Part1  pp.217-226,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3676
7.

Conference Proceedings
Conference Proceedings
7. Space-charge results from the SCALPEL proof-of-concept system
Liddle,J.A. ; Blakey,M.I. ; Gallatin,G.M. ; Knurek,C.S. ; Mkrtchyan,M.M. ; Novembre,A.E. ; Waskiewicz,W.K.
Pub. info.: Emerging lithographic technologies III : 15-17 March 1999, Santa Clara, California.  Part1  pp.180-193,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3676
8.

Conference Proceedings
Conference Proceedings
8. Overview of SCALPEL mask technology
Bogart,G.R. ; Novembre,A.E. ; Kornblit,A. ; Peabody,M.L. ; Farrow,R.C. ; Blakey,M.I. ; Kasica,R.J. ; Liddle,J.A. ; Saunders,T.E. ; Knurek,C.S.
Pub. info.: 15th European Conference on Mask Technology for Integrated Circuits and Microcomponents '98 : 16-17 November 1998, Munich-Unterhaching, Germany.  pp.18-19,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3665
9.

Conference Proceedings
Conference Proceedings
9. SCALPEL proof-of-concept system:preliminary lithography results
Waskiewicz,W.K. ; Biddick,C.J. ; Blakey,M.I. ; Brady,K.J. ; Camarda,R.M. ; Connelly,W.F. ; Crorken,A.H. ; Custy,J.P. ; DeMarco,R. ; Farrow,R.C. ; Felker,J.A. ; Fetter,L.A. ; Freeman,R.R. ; Harriott,L.R. ; Huggins,H.A. ; Kasica,R.J. ; Knurek,C.S. ; Kraus,J.S. ; Liddle,J.A.
Pub. info.: Emerging lithographic technologies : 10-11 March 1997, Santa Clara, California.  pp.255-263,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3048
10.

Conference Proceedings
Conference Proceedings
10. Optimization of DUV chemically amplified resist platforms for SCALPEL e-beam exposure
Ocola,L.E. ; Blakey,M.I. ; Orphanos,P.A. ; Li,W.-Y. ; Novembre,A.E. ; Brainard,R.L. ; Mackevich,J.F. ; Taylor,G.N.
Pub. info.: Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA.  pp.194-203,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3997