1.

Conference Proceedings
Conference Proceedings
1. Methacrylate resists and antireflective coatings for 193-nm lithography
Taylor, G. N. ; Trefonas, P. ; Szmanda, C. R. ; Barclay, G. G. ; Kavanagh, R. J. ; Blacksmith, R. F. ; Joesten, L. A. ; Monaghan, M. J. ; Coley, S. ; Mao, Z. ; Cameron, J. F. ; Hardy, R. ; Gronbeck, D. ; Connolly, S.
Pub. info.: Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California.  pp.174-185,  1999.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3678
2.

Conference Proceedings
Conference Proceedings
2. Simple method for measuring acid generation quantum efficiency at 193nm
Szmanda, C. R. ; Kavanagh, R. J. ; Bohland, J. R. ; Cameron, J. F. ; Trefonas, P. ; Blacksmith, R. F.
Pub. info.: Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California.  pp.857-866,  1999.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3678
3.

Conference Proceedings
Conference Proceedings
3. Organic antireflective coatings for 193-nm lithography
Trefonas, P. ; Blacksmith, R. F. ; Szmanda, C. R. ; Kavanagh, R. J. ; Adams, T. G. ; Taylor, G. N. ; Coley, S. ; Pohlers, G.
Pub. info.: Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California.  pp.702-712,  1999.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3678