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14 results

Conference Proceedings

1. A new generation of progressive mask defects in the pattern side of advenced photomasks [6281-24]

Grenon, J. B. ; Bhattacharyya, K. ; Eynon, B.

Pub. info.:	EMLC 2006 : 22nd European Mask and Lithography Conference : 23-26 January 2006, Dresden, Germany. pp.62810J-, 2006. Bellingham, Wash.,. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6281

Conference Proceedings

2. A cost model comparing image qualification and direct mask inspection [6349-139]

Bhattacharyya, K. ; Hazari, V. ; Sutherland, D. ; Higashiki, T.

Pub. info.:	Photomask Technology 2006. pp.63493N-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6349

Conference Proceedings

3. An investigation of a new generation of progressive mask defects on the pattern side of advanced photomasks [5853-13]

Bhattacharyya, K. ; Eickhoff, M. ; Grenon, B. ; Ma, M. ; Pas, S.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology XII. pp.100-108, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5853

Conference Proceedings

4. High-resolution mask inspection in advanced tab [6349-28]

Maelzer, S. ; Poock, A. ; Reese, B. ; Bhattacharyya, K. ; Mirzaagha, F. ; Cox, S. ; Lang, M.

Pub. info.:	Photomask Technology 2006. pp.63490S-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6349

Conference Proceedings

5. Wafer fob mask qualification techniques and limitations [6349-30]

Poock, A. ; Maelzer, S. ; Spence, C. ; Tabery, C. ; Lang, M. ; Schnasse, G. ; Peikert, M. ; Bhattacharyya, K.

Pub. info.:	Photomask Technology 2006. pp.63490U-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6349

Conference Proceedings

6. Investigation of reticle defect formation at DUV lithography

Bhattacharyya, K. ; Volk, W.W. ; Grenon, B.J. ; Brown, D. ; Ayala, J.

Pub. info.:	22nd Annual BACUS Symposium on Photomask Technology. Part One pp.478-487, 2002. Bellingham, WA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4889

Conference Proceedings

7. A reticle quality management strategy in wafer fabs addressing progressive mask defect growth problem at low-k1 lithography

Bhattacharyya, K. ; Son, K. ; Eynon, B. G. ; Gudmundsson, D. ; Jaehnert, C. ; Uhlig, D.

Pub. info.:	24th Annual BACUS Symposium on Photomask Technology. pp.89-97, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5567

Conference Proceedings

8. Reticle surface contaminants and their relationship to sub-pellicle defect formation

Grenon, B.J. ; Bhattacharyya, K. ; Volk, W.W. ; Phan, K.A. ; Poock, A.

Pub. info.:	Metrology, Inspection, and Process Control for Microlithography XVIII. pp.355-362, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5375

Conference Proceedings

9. A high-resolution contamination-mode inspection method providing a complete solution to the inspection challenges for advanced photomasks

Bhattacharyya, K. ; Huang, Y.-T. ; Son, K. ; Wang, D. ; Liu, L. ; Liao, C.H. ; Dai, Y.-M. ; Lin, J.-C.

Pub. info.:	Metrology, Inspection, and Process Control for Microlithography XVIII. pp.744-752, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5375

10.

Conference Proceedings

10. High-resolution reticle inspection technique providing a complete reticle qualification solution in advanced 90-nm node wafer fabs

Liu, L. ; Liao, C.-H. ; Dai, Y.-M. ; Lin, J.-C. ; Bhattacharyya, K. ; Huang, Y.-T. ; Son, K. ; Wang, D.

Pub. info.:	23rd Annual BACUS Symposium on Photomask Technology. pp.431-439, 2003. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5256

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