1.

Conference Proceedings
Conference Proceedings
1. Automated campaign system [6076-06]
Vondran, G. ; Chao, H. ; Lin, X. ; Beyer, D. ; Joshi, P. ; Atkins, B. ; Obrador, P.
Pub. info.: Digital publishing : 16-17 January, 2006, San Jose, California, USA.  pp.607605-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6076
2.

Conference Proceedings
Conference Proceedings
2. Achieving CDU requirement for 90-nm technology node and beyond with advanced mask making process technology
Tzu, S.-D. ; Chang, C.-H. ; Chen, W.-C. ; Kliem, K.-H. ; Hudek, P. ; Beyer, D.
Pub. info.: Advanced microlithography technologies : 8-10 November, 2004, Beijing, China.  pp.100-108,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5645
3.

Conference Proceedings
Conference Proceedings
3. Data prep: the bottleneck of future applications? [6281-20]
Gramss, J. ; Eichhorn, H. ; Lemke, M. ; Jaritz, R. ; Neick, V. ; Beyer, D. ; Buerger, B. ; Baetz, U. ; Kunze, K. ; Belic, N.
Pub. info.: EMLC 2006 : 22nd European Mask and Lithography Conference : 23-26 January 2006, Dresden, Germany.  pp.62810G-,  2006.  Bellingham, Wash.,.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6281
4.

Conference Proceedings
Conference Proceedings
4. Avoidance/reduction of charging effects in case of partially insufficient substrate conductivity when using ESPACER 300Z
Plontke, R. ; Bettin, L. ; Beyer, D. ; Butschke, J. ; Irmscher, M. ; Koepernik, C. ; Leibold, B. ; Vix, A. B. E. ; Voehringer, P.
Pub. info.: 20th European Conference on Mask Technology for Integrated Circuits and Microcomponents.  pp.188-196,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5504
5.

Conference Proceedings
Conference Proceedings
5. Mask pafferning using chemically amplified resists and the novel STEAG HamaTech blank coater ASR5000
Koepernik, C. ; Beyer, D. ; Dress, P. ; Hoffmann, T. ; Hudek, P. ; Irmscher, M. ; Krauss, C. ; Leibold, B. ; Mueller, D. ; Reuter, C. ; Springer, R. ; Szekeresch, J. ; Voehringer, P.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part One  pp.725-736,  2002.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
6.

Conference Proceedings
Conference Proceedings
6. Comparative evaluation of e-beam sensitive chemically amplifild resists for mask making
Irmscher, M. ; Beyer, D. ; Butschke, J. ; Constantine, C. ; Hoffmann, T. ; Koepernik, C. ; Krauss, C. ; Leibold, B. ; Letzkus, F. ; Mueller, D. ; Springer, R. ; Voehringer, P.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology IX.  pp.176-187,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4754
7.

Conference Proceedings
Conference Proceedings
7. Back to square 9: a demonstration of 9-in. reticle capability
Cummings, K.D. ; Schneider-Stoermann, L.U. ; Buttgereit, U. ; Irmscher, M. ; Mueller, D. ; Hudek, P. ; Beyer, D. ; Brendel, B. ; Whittey, J.M. ; Eynon, B.G. ; Harsch, J. ; Constantine, C. ; Miller, K.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part One  pp.15-24,  2002.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
8.

Conference Proceedings
Conference Proceedings
8. Mask patterning process using the negative tone chemically amplified resist TOK OEBR-CAN024
Irmscher, M. ; Beyer, D. ; Butschke, J. ; Hudek, P. ; Koepernik, C. ; Plumhoff, J. ; Rausa, E. ; Sato, M. ; Voehringer, P.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.46-57,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446
9.

Conference Proceedings
Conference Proceedings
9. 90-nm mask making processes using the positive tone chemically amplified resist FEP171
Butschke, J. ; Beyer, D. ; Constantine, C. ; Dress, P. ; Hudek, P. ; Irmscher, M. ; Koepernik, C. ; Krauss, C. ; Plumhoff, J. ; Voehringer, P.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.344-354,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256
10.

Conference Proceedings
Conference Proceedings
10. Second-level imaging of advanced alternating phase-shift masks using e-beam lithography
Leibold, B. ; Butschke, J. ; Bettin, L. ; Beyer, D. ; Irmscher, M. ; Koepernik, C. ; Plontke, R. ; Vix, A. ; Voehringer, P.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.1034-1044,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256