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Conference Proceedings

1. High-power source and illumination system for extreme ultraviolet lithography

Kubiak,G.D. ; Bernardez,L.J. ; Krenz,K D. ; Replogle,W.C. ; Sweatt,W.C. ; Sweeney,D.W. ; Hudyma,R.M. ; Shields,H.

Pub. info.:	EUV, x-ray, and neutron optics and sources : 21-23 July 1999, Denver, Colorado. pp.136-142, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3767

Conference Proceedings

2. Scale-up of a cluster jet laser plasma source for extreme ultraviolet lithography

Kubiak,G.D. ; Bernardez,L.J. ; Krenz,K.D. ; Sweatt,W.C.

Pub. info.:	Emerging lithographic technologies III : 15-17 March 1999, Santa Clara, California. Part2 pp.669-678, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3676

Conference Proceedings

3. EUV absorption in a laser-produced plasma source

Kanouff,M.P. ; Shields,H. ; Bernardez,L.J. ; Kubiak,G.D.

Pub. info.:	Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA. pp.507-514, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4343