1.

Conference Proceedings
Conference Proceedings
1. UVIII-positive chemically amplified resist optimization
Rocque,J.M. ; Brooks,C.J. ; Henry,R.W. ; Benoit,D.E. ; Mangat,P.J.S.
Pub. info.: Emerging lithographic technologies II : 23-25 February 1998, Santa Clara, California.  pp.487-495,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3331
2.

Conference Proceedings
Conference Proceedings
2. Characterization of oxynitride hard mask removal processes for refractory x-ray mask fabrication
Brooks,C.J. ; Benoit,D.E. ; Racette,K.C. ; Puisto,D.M. ; Whig,R. ; Dauksher,W.J. ; Cummings,K.D.
Pub. info.: Emerging lithographic technologies II : 23-25 February 1998, Santa Clara, California.  pp.255-260,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3331
3.

Conference Proceedings
Conference Proceedings
3. Advanced refractory-metal and process technology for the fabrication of x-ray masks
Brooks,C.J. ; Racette,K.C. ; Lercel,M.J. ; Powers,L.A. ; Benoit,D.E.
Pub. info.: Emerging lithographic technologies III : 15-17 March 1999, Santa Clara, California.  Part1  pp.14-23,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3676
4.

Conference Proceedings
Conference Proceedings
4. UVN2-negative chemically amplified resist optimization for x-ray mask fabrication
Rocque,J.M. ; Lercel,M.J. ; Brooks,C.J. ; Henry,R.W. ; Benoit,D.E.
Pub. info.: Emerging lithographic technologies III : 15-17 March 1999, Santa Clara, California.  Part1  pp.46-55,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3676
5.

Conference Proceedings
Conference Proceedings
5. X-ray mask image-placement studies at the Microlithography Mask Development Center
Puisto,D. ; Lawliss,M. ; Faure,T. ; rocque,J.M. ; Kimmel,K.R. ; Benoit,D.E.
Pub. info.: Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI : 11-13 March 1996, Santa Clara, California.  pp.204-210,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2723