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18 results

Conference Proceedings

1. Ultra-Shallow Junctions in Si 1-x Ge x Formed by Molecular-Beam Epitaxy

Thompson, P.E. ; Bennett, J.

Pub. info.:	Rapid thermal and other short-time processing technologies III : proceedings of the international symposium. pp.381-388, 2002. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2002-11

Conference Proceedings

2. Shallow Junction Formation by Small Cluster Implantation

Lu, X. ; Shao, L. ; Wang, X. ; Chen, Q. ; Liu, J. ; Chu, W.K. ; Bennett, J. ; Larson, L.

Pub. info.:	Rapid thermal and other short-time processing technologies II : proceedings of the international symposium. pp.337-344, 2001. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2001-9

Conference Proceedings

3. (4.12) 7:58 - 8:01 PM - SIMS Depth Profiling of Band As Implants in Si1_xGex and Strained Si/Si1_xGex

Bennett, J. ; Kohli, P. ; Wise, R. ; Rodder, M. ; Yu, S. ; Cleavelin, R. ; Pas, M. ; Braithwaite, G. ; Currie, M.T. ; Lochtefeld, A. (SEMATECH)

Pub. info.:	SiGe: materials, processing, and devices : proceedings of the First international symposium. pp.239-242, 2004. Pennington, N.J.. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2004-07

Conference Proceedings

4. (18.5) 11:35 - 11:55 AM - Ultra-Shallow Junction Formation in Strained Si/Sil-xGex using Flash-Assist RTA

Kohli, P. ; Wise, R. ; Braithwaite, G. ; Currie, M. T. ; Lochtefeld, A. ; Rodder, M. ; Bennett, J. ; Gostowski, M. ; Nguyen, B. ; Cleavelin, R. ; Yu, S. ; Pas, M. ; Gelpey, J. ; McCoy, S. ; Campion, A. ; Chaumont, M. (SEMATECH)

Pub. info.:	SiGe: materials, processing, and devices : proceedings of the First international symposium. pp.1113-1114, 2004. Pennington, N.J.. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2004-07

Conference Proceedings

5. Effect of surface roughness of substrate to grazing incidence x-ray optics

Tamura, K. ; Yamashita, K. ; Kunieda, H. ; Tawara, Y. ; Haga, K. ; Nakajo, N. ; Okajima, T. ; Lodha, G.S. ; Namba, Y. ; Yu, J. ; Bennett, J.

Pub. info.:	Crystal and multilayer optics : 21-22 July, 1998, San Diego, California. pp.303-312, 1998. Bellingham, Wash.. SPIE
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3448

Conference Proceedings

6. Experimental Observations of the Redistribution of Implanted Nitrogen at the Si-SiO2 Interface During RTA Processing

Lysaght, P. S. ; Nguyen, B. ; Bennett, J. ; Williamson, G. ; Torres, K. ; Gilmer, M. ; Luo, T-Y. ; Brady, D. ; Guan, J. ; Brown, G. A. ; Zeitzoff, P. ; Bersuker, G. ; Mucha, J. ; Geyling, F. ; Gebera, G. ; Vishnubhotla, L. ; Jackson, M. D. ; Huff, H. R.

Pub. info.:	Si front-end processing - physics and technology of dopant-defect interactions : symposium held April 6-9, 1999, San Francisco, California, U.S.A.. pp.283-, 1999. Warrendale, PA. MRS - Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	568

Conference Proceedings

7. Enhanced Boron Diffusion in Amorphous Silicon

Jacques, J.M. ; Burbure, N. ; Jones, K.S. ; Law, M.E. ; Robertson, L.S. ; Downey, D.F. ; Rubin, L.M. ; Bennett, J. ; Beebe, M. ; Klimov, M.

Pub. info.:	Silicon front-end junction formation : physics and technology : symposium held April 13-15, 2004, San Francisco, California, U.S.A.. pp.443-448, 2004. Warrendale, Pa.. Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	810

Conference Proceedings

8. Comparison of MOSFET Characteristics Between ALD and MOCVD TiN Metal Gate on Hf Silicate

Song, S.C. ; Lee, B.H. ; Zhang, Z. ; Choi, K. ; Bae, S.H. ; Alshareef, H. ; Majhi, P. ; Wen, H.C. ; Bennett, J. ; Sassman, B. ; Zeitzoff, P.

Pub. info.:	ULSI Process Integration : proceedings of the International Symposium. pp.419-424, 2005. Pennington, N.J.. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2005-06

Conference Proceedings

9. IMPACT OF ORGANIC CONTAMINATION ON DEVICE PERFORMANCE

Riley, D. ; Guan, I. ; Gale, G. ; Bersuker, G. ; Bennett, J. ; Lysaght, P. ; Nguyen, B.

Pub. info.:	Cleaning technology semiconductor device manufacturing : proceedings of the seventh international symposium. pp.39-46, 2001. Pennington, N.J.. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2001-26

10.

Conference Proceedings

10. Stability of Ultra-Shallow Junctions Formed by 0.2 keV Boron Implantation and Spike Annealing

ang, J. Bennett ; L., Larsen ; I., Rusakova ; H., Chen ; J., Lia ; W.-K., Chu ; Shao, L. ; Wang, X. ; Bennett, J. ; Larsen, L. ; Rusakova, I. ; Chen, H. ; Lia, J. ; Chu, W.-K.

Pub. info.:	Rapid thermal and other short-time processing technologies III : proceedings of the international symposium. pp.333-338, 2002. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2002-11

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Author: Bennett, J.