1.

Conference Proceedings
Conference Proceedings
1. Etch Induced Damage in High Density Inductively Coupled Plasma Etching Reactor
Zhong, W. ; Misra, D. ; Bartynski, R.A. ; Patel, V. ; Singh, B.
Pub. info.: Proceedings of the tenth symposium on plasma processing.  pp.120-131,  1994.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 1994-20
2.

Conference Proceedings
Conference Proceedings
2. Band Alignment Issues in Metal/Dielectric Stacks: A Combined Photoemission and Inverse Photoemission Study of the HfO2/Pt and HfO2/Hf Systems
Sayan, S. ; Bartynski, R.A. ; Robertson, J. ; Suehle, J.S. ; Vogel, E. ; Nguyen, N.V. ; Ehrstein, J. ; Kopanski, J.J. ; Suzer, S. ; Holl, M.B. ; Garfunkel, E.
Pub. info.: Advanced short-time thermal processing for Si-based CMOS devices : proceedings of the international symposium.  pp.255-263,  2004.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2004-01
3.

Conference Proceedings
Conference Proceedings
3. Silicon Nitride Passivation for InP Based Devices
Ren, F. ; Buckley, N. ; Lee, K. ; Pearton, S.J. ; Bartynski, R.A. ; Constantine, C. ; Hobson, W.S. ; Chao, P.C.
Pub. info.: Proceedings of the Twenty-first State-of-the-Art Program on Compound Semiconductors (SOTAPOCS XXI).  pp.187-196,  1994.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 1994-34