1.

Conference Proceedings
Conference Proceedings
1. 33 ALD of Advanced High-k and Metal Gate Stacks for MOS Devices
Gutt, J. ; Gopalan, S. ; Brown, G. A. ; Kirsch, P. D. ; Peterson, J. J. ; Gardner, M. ; Li, H.-J. ; Lysaght, P. ; Alshareef, H. N. ; Choi, K. ; Huffman, C. ; Wen, H. C. ; Majhi, P. ; Lee, B. H. ; Chatham, H. ; Park, S. ; Lanee, S. ; Bartholomew, L. ; Senzaki, Y. (Invited Paper)
Pub. info.: Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium.  pp.282-292,  2005.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2005-05
2.

Conference Proceedings
Conference Proceedings
2. A Novel Atomic Layer Deposition Process to Deposit Hafnium Silicate Thin Films
Senzaki, Y. ; Park, M. ; Bartholomew, L. ; Chatham, H.
Pub. info.: Advanced short-time thermal processing for Si-based CMOS devices : proceedings of the international symposium.  pp.264-270,  2004.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2004-01