1.

Conference Proceedings
Conference Proceedings
1. Gate Stack Formation Using a Fully Integrated Single Wafer Cluster Tool
Frystak, David C. ; Kuehne, John ; Wise, Rick ; Fowler, Burt ; Grothe, Phil ; Barnett, Joel ; Miner, Gary
Pub. info.: Rapid thermal and integrated processing VI : symposium held April 1-4, 1997, San Francisco, California, U.S.A..  pp.221-,  1997.  Pittsburgh, PA.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 470
2.

Conference Proceedings
Conference Proceedings
2. Challenges in Integrating the High-K Gate Dielectric Film to the Conventional CMOS Process Flow
Agarwal, Avinash ; Freiler, Michael ; Lysaght, Pat ; Perrymore, Loyd ; Bergmann, Renate ; Sparks, Chris ; Bowers, Bill ; Barnett, Joel ; Riley, Deborah ; Kim, Yudong ; Nguyen, Billy ; Bersuker, Gennadi ; Shero, Eric ; Lim, Jae E. ; Lin, Steven ; Chen, Jerry ; Murto, Robert W. ; Huff, Howard R.
Pub. info.: Gate stack and silicide issues in silicon processing II : symposium held April 17-19, 2001, San Francisco, California, U.S.A..  2002.  Warrendale, PA.  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 670
3.

Conference Proceedings
Conference Proceedings
3. Experimental Study of Etched Back Thermal Oxide for Optimization of the Si/High-k Interface
Barnett, Joel ; Moumen, N. ; Gutt, J. ; Gardner, M. ; Huffman, C. ; Majhi, P. ; Peterson, J.J. ; Gopalan, S. ; Foran, B. ; Li, H.-J. ; Lee, B.H. ; Bersuker, G. ; Zeitzoff, P.M. ; Brown, G.A. ; Lysaght, P. ; Young, C. ; Murto, R.W. ; Huff, H.R.
Pub. info.: Integration of advanced micro- and nanoelectronic devices - critical issues and solutions : symposium held April 13-16, 2004, San Francisco, California, U.S.A..  pp.841-846,  2004.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 811