1.

Conference Proceedings
Conference Proceedings
1. Sub-120-nm technology compatibility of attenuated phase-shift mask in KrF and ArF lithography
Ham,Y.-M. ; Kim,S.-M. ; Kim,S.-J. ; Bae,S.-M. ; Kim,Y.-D. ; Baik,K.-H.
Pub. info.: 20th Annual BACUS Symposium on Photomask Technology.  pp.359-371,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4186
2.

Conference Proceedings
Conference Proceedings
2. Impact of ArF attenuated PSM using multishifter layer (TiN/Si3N4) for next-generation lithography
Nam,K.-H. ; Kim,L.-J. ; Jeong,H.-S. ; Lee,S.-W. ; Lee,I.-S. ; Shin,C. ; Kim,H.-S. ; Dieu,L. ; Paek,S.W. ; Koo,S.-S. ; Bae,S.-M. ; Ham,Y.-M. ; Shin,K.-S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VIII.  pp.70-80,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4409
3.

Conference Proceedings
Conference Proceedings
3. Peformances of triple-tone contact hole mask for optical lithography extensions
Bae,S.-M. ; Lee,M.-H. ; Kim,S.-C. ; Han,O.
Pub. info.: 21st Annual BACUS Symposium on Photomask Technology.  4562  pp.1026-1037,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4562
4.

Conference Proceedings
Conference Proceedings
4. Performance of new overlay measurement mark
Bae,S.-M. ; Baik,K.-H.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography X.  pp.424-435,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2725